Kinetics of the reaction atomic oxygen + chlorine oxide (ClO) .fwdarw. atomic chlorine + molecular oxygen

1984 ◽  
Vol 88 (7) ◽  
pp. 1394-1398 ◽  
Author(s):  
Ming Taun Leu
Keyword(s):  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Chlorine Oxide ◽  
Kinetics Of ◽  
Atomic Chlorine

Oxidation Kinetics of Yba2Cu3OT7-x Thin Films in the Presence of Atomic Oxygen and Molecular Oxygen by In-Situ Resistivity Measurement

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Thin Films ◽  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Oxygen Stoichiometry ◽  
Ambient Conditions ◽  
Kinetics Of Oxidation ◽  
Thermally Activated ◽  
Kinetics Of

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.

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