PERFLUOROPIPERIDINE: ENTROPY, HEAT OF FORMATION, AND VAPOR PRESSURE; N-F BOND ENERGY; AND SOLID-STATE TRANSITIONS1,2

1963 ◽  
Vol 67 (6) ◽  
pp. 1306-1311 ◽  
Author(s):  
W. D. Good ◽  
S. S. Todd ◽  
J. F. Messerly ◽  
J. L. Lacina ◽  
J. P. Dawson ◽  
...  
1952 ◽  
Vol 74 (23) ◽  
pp. 6025-6030 ◽  
Author(s):  
W. N. Hubbard ◽  
H. L. Finke ◽  
D. W. Scott ◽  
J. P. McCullough ◽  
C. Katz ◽  
...  

Molecules ◽  
2020 ◽  
Vol 25 (5) ◽  
pp. 1200
Author(s):  
Miroslav Havránek ◽  
Maksim A. Samsonov ◽  
Josef Holub ◽  
Zdeňka Růžičková ◽  
Ladislav Drož ◽  
...  

Although 1-Ph-2-X-closo-1,2-C2B10H10 (X = F, Cl, Br, I) derivatives had been computed to have positive values of the heat of formation, it was possible to prepare them. The corresponding solid-state structures were computationally analyzed. Electrostatic potential computations indicated the presence of highly positive σ-holes in the case of heavy halogens. Surprisingly, the halogen•••π interaction formed by the Br atom was found to be more favorable than that of I.


1953 ◽  
Vol 75 (12) ◽  
pp. 2795-2800 ◽  
Author(s):  
D. W. Scott ◽  
H. L. Finke ◽  
W. N. Hubbard ◽  
J. P. McCullough ◽  
C. Katz ◽  
...  

1990 ◽  
Vol 187 ◽  
Author(s):  
J.Y. Cheng ◽  
M.H. Wang ◽  
L.J. Chen

AbstractFormation and growth of amorphous interlayers (a-interlayers) in nine refractroy metal and silicon systems by solid-state diffusion have been investigated by conventional and high resolution transmission electron microscopy. The amorphous interlayers were found to form in samples annealed at 350–650 °C. The growth was found to follow a linear growth law initially then slow down until a critical thicknees was reached. The interface structures were examined. The correlations among difference in atomic size between metal and Si atoms, growth rate and activation energy of the linear growth, critical and maximum a-interlayer thickness, the largest heat of formation energy for crystalline silicides, the calculated free energy difference in forming amorphous phase as well as atomic mobility in refractroy metal/silicon systems are discussed.


1993 ◽  
Vol 322 ◽  
Author(s):  
Richard M. Jacubinas ◽  
Richard B. Kaner

AbstractMosi2 has a very favorable combination of materials properties, including a high melting point (2020°C), high strength at elevated temperatures, and resistance to high temperature oxidation and corrosion. These properties make it a good candidate for a hightemperature structural material; however, it has very poor ductility. A great deal of research has focused on improving the ductility of this alloy through various preparative routes. We have synthesized Mosi2, as well as WSi2, TaSi2, and NbSi2, using rapid solid-state metathesis reactions between a high oxidation state metal halide and an alkaline earth silicide. These reactions take advantage of the large exothermic heat of formation of the alkaline earth halide and can reach temperatures as high as the melting point of the product silicides. In addition, this approach yields crystalline products in seconds. The synthetic technique will be discussed along with characterization results.


1967 ◽  
Vol 6 (4) ◽  
pp. 805-807 ◽  
Author(s):  
H. S. Hull ◽  
Allen Forrest Reid ◽  
Alan G. Turnbull

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