Absolute Cross Section for Dissociative Electron Attachment to CF4 Condensed onto Multilayer Krypton

1995 ◽  
Vol 99 (16) ◽  
pp. 6123-6127 ◽  
Author(s):  
Andrew D. Bass ◽  
Jerry Gamache ◽  
Luc Parenteau ◽  
Leon Sanche
Keyword(s):  
Cross Section ◽  
Electron Attachment ◽  
Absolute Cross Section ◽  
Dissociative Electron Attachment

Absolute cross section for dissociative electron attachment inO2condensed on Kr film

1990 ◽  
Vol 64 (5) ◽  
pp. 523-526 ◽  
Author(s):  
H. Sambe ◽  
D. E. Ramaker ◽  
M. Deschenes ◽  
A. D. Bass ◽  
L. Sanche
Keyword(s):  
Cross Section ◽  
Electron Attachment ◽  
Absolute Cross Section ◽  
Dissociative Electron Attachment

scholarly journals Взаимодействие низкоэнергетических электронов с молекулами D-рибозы

2021 ◽  
Vol 129 (12) ◽  
pp. 1471
Author(s):  
И.В. Чернышова ◽  
Е.Э. Контрош ◽  
О.Б. Шпеник
Keyword(s):  
Total Cross Section ◽  
Energy Range ◽  
Cross Section ◽  
Electron Scattering ◽  
Cross Sections ◽  
Electron Attachment ◽  
Low Energy ◽  
Dissociative Electron Attachment ◽  
Low Energy Electrons ◽  
First Time

Abstract– The interactions of low-energy electrons (<20 eV) with D-ribose molecules, namely, electron scattering and dissociative attachment, are studied. The results of these studies showed that the fragmentation of D-ribose molecules occurs effectively even at an electron energy close to zero. as well as in the energy range 5.50–9.50 eV. In the total cross section of electron scattering by molecules, resonance features at energies of 5.00–9.00 eV in the region of formation of ionic fragments C3H4O2–, C2H3O2–, OH–, associated with the destruction of molecular heterocycles, were experimentally discovered for the first time. The correlation of the features observed in the scattering and dissociative electron attachment cross sections is analyzed.

Dissociative electron attachment cross section to CHCl3 using a high resolution crossed beams technique

1997 ◽  
Vol 107 (21) ◽  
pp. 8955-8962 ◽  
Author(s):  
S. Matejcik ◽  
G. Senn ◽  
P. Scheier ◽  
A. Kiendler ◽  
A. Stamatovic ◽  
...  
Keyword(s):  
High Resolution ◽  
Cross Section ◽  
Electron Attachment ◽  
Dissociative Electron Attachment ◽  
Crossed Beams ◽  
Attachment Cross Section

scholarly journals Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes

2017 ◽  
Vol 8 ◽  
pp. 2562-2571 ◽  
Author(s):  
Sascha Koch ◽  
Christopher D Kaiser ◽  
Paul Penner ◽  
Michael Barclay ◽  
Lena Frommeyer ◽  
...  
Keyword(s):  
Cross Section ◽  
Current Density ◽  
Electron Attachment ◽  
The Other ◽  
Self Assembled Monolayers ◽  
Cross Linking ◽  
Dissociative Electron Attachment ◽  
Electron Dose ◽  
Assembled Monolayers ◽  
The Cross

The determination of the negative ion yield of 2′-chloro-1,1′-biphenyl (2-Cl-BP), 2′-bromo-1,1′-biphenyl (2-Br-BP) and 2′-iodo-1,1′-biphenyl (2-I-BP) upon dissociative electron attachment (DEA) at an electron energy of 0 eV revealed cross section values that were more than ten times higher for iodide loss from 2-I-BP than for the other halogenides from the respective biphenyls (BPs). Comparison with dissociative ionization mass spectra shows that the ratio of the efficiency of electron impact ionization induced fragmentation of 2-I-BP, 2-Br-BP, and 2-Cl-BP amounts to approximately 1:0.7:0.6. Inspired by these results, self-assembled monolayers (SAMs) of the respective biphenyl-4-thiols, 2-Cl-BPT, 2-Br-BPT, 2-I-BPT as well as BPT, were grown on a Au(111) substrate and exposed to 50 eV electrons. The effect of electron irradiation was investigated by X-ray photoelectron spectroscopy (XPS), to determine whether the high relative DEA cross section for iodide loss from 2-I-BPT as compared to 2-Br-BP and 2-Cl-BP is reflected in the cross-linking efficiency of SAMs made from these materials. Such sensitization could reduce the electron dose needed for the cross-linking process and may thus lead to a significantly faster conversion of the respective SAMs into carbon nanomembranes (CNMs) without the need for an increased current density. XPS data support the notation that DEA sensitization may be used to achieve more efficient electron-induced cross-linking of SAMs, revealing more than ten times faster cross-linking of 2-I-BPT SAMs compared to those made from the other halogenated biphenyls or from native BPT at the same current density. Furthermore, the transfer of a freestanding membrane onto a TEM grid and the subsequent investigation by helium ion microscopy (HIM) verified the existence of a mechanically stable CNM created from 2-I-BPT after exposure to an electron dose as low as 1.8 mC/cm2. In contrast, SAMs made from BPT, 2-Cl-BPT and 2-Br-BPT did not form stable CNMs after a significantly higher electron dose of 9 mC/cm2.

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