Hydrogen bonding in alkylammonium chlorometalates of the first transition metals

1991 ◽  
Vol 30 (8) ◽  
pp. 1878-1881 ◽  
Author(s):  
Kenneth. Emerson ◽  
Pascual. Roman ◽  
Antonio. Luque ◽  
Juan Manuel. Gutierrez-Zorilla ◽  
Martin. Martinez-Ripoll
Keyword(s):  
Hydrogen Bonding ◽  
Transition Metals

Interactions Between Water and Rhodium Clusters: Molecular Adsorption versus Cluster Adsorption

Nanoscale ◽  
2021 ◽  
Author(s):  
Yuhan Jia ◽  
Huiming Wu ◽  
Xiao-Yun Zhao ◽  
Hanyu Zhang ◽  
Lijun Geng ◽  
...  
Keyword(s):  
Hydrogen Bonding ◽  
Transition Metals ◽  
Molecular Adsorption ◽  
Water Droplets ◽  
Rhodium Clusters ◽  
Metal Water

Understanding metal-water interactions and the hydrogen-bonding in water droplets is important but highly challenging. Various transition metals may serve as effective coordination centers to water; however, not in all cases...

Crystal chemistry and metal-hydrogen bonding in anisotropic and interstitial hydrides of intermetallics of rare earth (R) and transition metals (T), RT3 and R2T7

2008 ◽  
Vol 223 (10) ◽  
Author(s):  
Volodymyr A. Yartys ◽  
Ponniah Vajeeston ◽  
Alexander B. Riabov ◽  
Ponniah Ravindran ◽  
Roman V. Denys ◽  
...  
Keyword(s):  
Hydrogen Bonding ◽  
Rare Earth ◽  
Transition Metals ◽  
Crystal Chemistry

Activation of the hypervalent fluoroiodane reagent by hydrogen bonding to hexafluoroisopropanol

2018 ◽  
Vol 16 (39) ◽  
pp. 7170-7173 ◽  
Author(s):  
Harsimran K. Minhas ◽  
William Riley ◽  
Alison M. Stuart ◽  
Martyna Urbonaite
Keyword(s):  
Hydrogen Bonding ◽  
Transition Metals

Hexafluoroisopropan-2-ol is an excellent solvent for promoting fluorinations with the stable hypervalent fluoroiodane reagent without any transition metals or TREAT-HF activators.

Precipitation in silicon: Microanalysis

1988 ◽  
Vol 46 ◽  
pp. 474-475
Author(s):  
R.W. Carpenter
Keyword(s):  
Transition Metals ◽  
Spatial Resolution ◽  
Thin Foil ◽  
Precipitation Reaction ◽  
High Current ◽  
Reaction Products ◽  
Carbon And Nitrogen ◽  
Dielectric Layers ◽  
Precipitation Processes ◽  
Areas Of Interest

Interest in precipitation processes in silicon appears to be centered on transition metals (for intrinsic and extrinsic gettering), and oxygen and carbon in thermally aged materials, and on oxygen, carbon, and nitrogen in ion implanted materials to form buried dielectric layers. A steadily increasing number of applications of microanalysis to these problems are appearing. but still far less than the number of imaging/diffraction investigations. Microanalysis applications appear to be paced by instrumentation development. The precipitation reaction products are small and the presence of carbon is often an important consideration. Small high current probes are important and cryogenic specimen holders are required for consistent suppression of contamination buildup on specimen areas of interest. Focussed probes useful for microanalysis should be in the range of 0.1 to 1nA, and estimates of spatial resolution to be expected for thin foil specimens can be made from the curves shown in Fig. 1.

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