Color oscillations in the formic acid-nitric acid-sulfuric acid system

1983 ◽  
Vol 60 (11) ◽  
pp. 994
Author(s):  
C. J. G. Raw ◽  
J. P. Kubik ◽  
R. E. Tecklenburg
Alloy Digest ◽  
2001 ◽  
Vol 50 (11) ◽  

Abstract Titanium shows outstanding resistance to seawater and marine atmospheres. It is also resistant to attack by hot metallic chloride solutions, sodium and potassium hypochlorite, and chlorine dioxide. The metal is resistant to attack by hot nitric acid at concentrations up to 80% and is not attacked by sulfuric acid. This datasheet provides information on composition, physical properties, hardness, elasticity, tensile properties, and bend strength as well as fatigue. It also includes information on high temperature performance and corrosion resistance as well as forming, heat treating, machining, and joining. Filing Code: TI-122. Producer or source: Timet.


2018 ◽  
Author(s):  
Harold Jeffrey M. Consigo ◽  
Ricardo S. Calanog ◽  
Melissa O. Caseria

Abstract Gallium Arsenide (GaAs) integrated circuits have become popular these days with superior speed/power products that permit the development of systems that otherwise would have made it impossible or impractical to construct using silicon semiconductors. However, failure analysis remains to be very challenging as GaAs material is easily dissolved when it is reacted with fuming nitric acid used during standard decapsulation process. By utilizing enhanced chemical decapsulation technique with mixture of fuming nitric acid and concentrated sulfuric acid at a low temperature backed with statistical analysis, successful plastic package decapsulation happens to be reproducible mainly for die level failure analysis purposes. The paper aims to develop a chemical decapsulation process with optimum parameters needed to successfully decapsulate plastic molded GaAs integrated circuits for die level failure analysis.


2000 ◽  
Vol 2000 (3) ◽  
pp. 106-107 ◽  
Author(s):  
C. Waterlot ◽  
B. Haskiak ◽  
D. Couturier

Various alkyl-substituted p-dimethoxybenzenes (ArH) react readily with nitric acid and sulfuric to form nitro-products (ArNO2). When the nitric acid is used in excess, the nitro-product react via either nitration to dinitro-compound (Ar(NO2)2) or via oxidative demethylation to nitro- p-quinone (Q). As such, the competition between the nitration, polynitration and oxidative dealkylation is effectively modulated by the added nitric acid and the alkyl-substituted p-dimethoxybenzenes.


2001 ◽  
Vol 105 (5) ◽  
pp. 829-837 ◽  
Author(s):  
Glen A. Frerichs ◽  
Tara M. Mlnarik ◽  
Robert J. Grun ◽  
Richard C. Thompson
Keyword(s):  

2021 ◽  
Vol 37 (2) ◽  
pp. 321-329
Author(s):  
Nilesh Takale ◽  
Neelakandan Kaliyaperumal ◽  
Gopalakrishnan Mannathusamy ◽  
Rajarajan Govindasamy

The Pharmaceutical industry uses formic acid in the manufacturing of various drug substances or API. At the time of manufacturing of API formic acid is use as an oxidizing agent. Formic acid is the simplest carboxylic acid. It also called methanoic acid.Formic acid present in API at high concentrations is very hazardous but in low concentrations is very beneficial. The developed and validated method was short, precise, cost effective and reproducible with FID detector and easy to use. The method is a selective and superficial analytical method for determination of formic acid in different drug substances. We report here the development and validation study of headspace gas chromatographic method to determine formic acid in different drug substances we are reported here. As per this method, the drug sample was dissolved in 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol (IPA) in a GC headspace vial and 0.1% (v/v) of concentrated sulfuric acid in isopropyl alcohol used as a diluent. A AB-Inowax capillary column (30 m x 0.32 mm I.D. and 0.5 µm film thickness) was used under gradient conditions with FID. The formic acid peak was well separated from all other solvents that are used in synthesis of particular drug substance. The LOD and LOQof the method for formic acid are 82 ppm and 249 ppm respectively. Formic acid are low toxic class-III solvent as per ICH guideline.


BioResources ◽  
2018 ◽  
Vol 13 (2) ◽  
Author(s):  
Rongge Zou ◽  
Yunfeng Zhao ◽  
Yunpu Wang ◽  
Dengle Duan ◽  
Liangliang Fan ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document