Pore Structure and Bifunctional Catalyst Activity of Overlayers Applied by Atomic Layer Deposition on Copper Nanoparticles

ACS Catalysis ◽  
2014 ◽  
Vol 4 (5) ◽  
pp. 1554-1557 ◽  
Author(s):  
Ana C. Alba-Rubio ◽  
Brandon J. O’Neill ◽  
Fengyuan Shi ◽  
Cem Akatay ◽  
Christian Canlas ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Pore Structure ◽  
Copper Nanoparticles ◽  
Catalyst Activity ◽  
Atomic Layer ◽  
Bifunctional Catalyst ◽  
Layer Deposition

Copper nanoparticles deposited inside the pores of anodized aluminium oxide using atomic layer deposition

2003 ◽  
Vol 23 (6-8) ◽  
pp. 823-826 ◽  
Author(s):  
A. Johansson ◽  
T. Törndahl ◽  
L.M. Ottosson ◽  
M. Boman ◽  
J.-O. Carlsson
Keyword(s):  
Atomic Layer Deposition ◽  
Copper Nanoparticles ◽  
Aluminium Oxide ◽  
Atomic Layer ◽  
Layer Deposition

Controlled pore structure modification of diatoms by atomic layer deposition of TiO2

2006 ◽  
Vol 16 (41) ◽  
pp. 4029 ◽  
Author(s):  
Dusan Losic ◽  
Gerry Triani ◽  
Peter J. Evans ◽  
Armand Atanacio ◽  
James G. Mitchell ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Pore Structure ◽  
Atomic Layer ◽  
Structure Modification ◽  
Layer Deposition

Modification of ceramic membranes for pore structure tailoring: The atomic layer deposition route

2012 ◽  
Vol 397-398 ◽  
pp. 17-23 ◽  
Author(s):  
Fengbin Li ◽  
Yang Yang ◽  
Yiqun Fan ◽  
Weihong Xing ◽  
Yong Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Pore Structure ◽  
Atomic Layer ◽  
Ceramic Membranes ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition ZnO Over-Coated Cu/SiO2 Catalysts for Methanol Synthesis from CO2 Hydrogenation

Catalysts ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 922 ◽  
Author(s):  
Jinglin Gao ◽  
Philip Effah Boahene ◽  
Yongfeng Hu ◽  
Ajay Dalai ◽  
Hui Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Catalyst Activity ◽  
Atomic Layer ◽  
Basic Site ◽  
Co2 Activation ◽  
Edge Structure ◽  
X Ray ◽  
Layer Deposition ◽  
Methanol Formation ◽  
Temperature Programmed

Cu-ZnO-based catalysts are of importance for CO2 utilization to synthesize methanol. However, the mechanisms of CO2 activation, the split of the C=O double bond, and the formation of C-H and O-H bonds are still debatable. To understand this mechanism and to improve the selectivity of methanol formation, the combination of strong electronic adsorption (SEA) and atomic layer deposition (ALD) was used to form catalysts with Cu nanoparticles surrounded by a non-uniform ZnO layer, uniform atomic layer of ZnO, or multiple layers of ZnO on porous SiO2. N2 adsorption, H2 temperature-programmed reduction (H2-TPR) X-ray diffraction (XRD), transmission electron microscope (TEM), energy-dispersive X-ray spectroscopy (EDX), CO-chemisorption, CO2 temperature-programmed desorption (CO2-TPD), X-ray adsorption near edge structure (XANES), and extended X-ray absorption fine structure (EXAFS) were used to characterize the catalysts. The catalyst activity was correlated to the number of metallic sites. The catalyst of 5 wt% Cu over-coated with a single atomic layer of ZnO exhibited higher methanol selectivity. This catalyst has comparatively more metallic sites (smaller Cu particles with good distribution) and basic site (uniform ZnO layer) formation, and a stronger interaction between them, which provided necessary synergy for the CO2 activation and hydrogenation to form methanol.

Size-Selective Catalytic Growth of Nearly 100% Pure Carbon Nanocoils with Copper Nanoparticles Produced by Atomic Layer Deposition

ACS Nano ◽  
2014 ◽  
Vol 8 (5) ◽  
pp. 5330-5338 ◽  
Author(s):  
Guizhen Wang ◽  
Gu Ran ◽  
Gengping Wan ◽  
Peng Yang ◽  
Zhe Gao ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Copper Nanoparticles ◽  
Atomic Layer ◽  
Catalytic Growth ◽  
Layer Deposition ◽  
Pure Carbon

The Effects of Plasma Treatments and Subsequent Atomic Layer Deposition on the Pore Structure of a k = 2.0 Low-k Material

2013 ◽  
Vol 2 (5) ◽  
pp. N103-N109 ◽  
Author(s):  
P. Verdonck ◽  
A. Maheshwari ◽  
J. Swerts ◽  
A. Delabie ◽  
T. Witters ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Pore Structure ◽  
Atomic Layer ◽  
Plasma Treatments ◽  
Layer Deposition ◽  
Low K

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition

Workfunction of Al-Doped ZnO Films Deposited by Atomic Layer Deposition

2018 ◽  
Author(s):  
Peter George Gordon ◽  
Goran Bacic ◽  
Gregory P. Lopinski ◽  
Sean Thomas Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Ratio ◽  
Aluminum Concentration ◽  
Zno Films ◽  
Transparent Conductor ◽  
Kelvin Probe ◽  
Layer Deposition ◽  
Earth Abundant ◽  
Doped Zno

Al-doped ZnO (AZO) is a promising earth-abundant alternative to Sn-doped In<sub>2</sub>O<sub>3</sub> (ITO) as an n-type transparent conductor for electronic and photovoltaic devices; AZO is also more straightforward to deposit by atomic layer deposition (ALD). The workfunction of this material is particularly important for the design of optoelectronic devices. We have deposited AZO films with resistivities as low as 1.1 x 10<sup>-3</sup> Ωcm by ALD using the industry-standard precursors trimethylaluminum (TMA), diethylzinc (DEZ), and water at 200<sup>◦</sup>C. These films were transparent and their elemental compositions showed reasonable agreement with the pulse program ratios. The workfunction of these films was measured using a scanning Kelvin Probe (sKP) to investigate the role of aluminum concentration. In addition, the workfunction of AZO films prepared by two different ALD recipes were compared: a “surface” recipe wherein the TMA was pulsed at the top of each repeating AZO stack, and a interlamellar recipe where the TMA pulse was introduced halfway through the stack. As aluminum doping increases, the surface recipe produces films with a consistently higher workfunction as compared to the interlamellar recipe. The resistivity of the surface recipe films show a minimum at a 1:16 Al:Zn atomic ratio and using an interlamellar recipe, minimum resistivity was seen at 1:19. The film thicknesses were characterized by ellipsometry, chemical composition by EDX, and resistivity by four-point probe.<br>

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