Precursors for Organometallic Chemical Vapor Deposition of Tungsten Carbide Films

Ken K. Lai; H. Henry Lamb

doi:10.1021/cm00060a016

Precursors for Organometallic Chemical Vapor Deposition of Tungsten Carbide Films

Chemistry of Materials ◽

10.1021/cm00060a016 ◽

1995 ◽

Vol 7 (12) ◽

pp. 2284-2292 ◽

Cited By ~ 19

Author(s):

Ken K. Lai ◽

H. Henry Lamb

Keyword(s):

Chemical Vapor Deposition ◽

Tungsten Carbide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organometallic Chemical Vapor Deposition

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High Band Gap Nanocrystalline Tungsten Carbide (nc-WC) Thin Films Grown by Hot Wire Chemical Vapor Deposition (HW-CVD) Method

Journal of Nano- and Electronic Physics ◽

10.21272/jnep.10(3).03001 ◽

2018 ◽

Vol 10 (3) ◽

pp. 03001-1-03001-6 ◽

Cited By ~ 2

Author(s):

Bharat Gabhale ◽

◽

Ashok Jadhawar ◽

Ajinkya Bhorde ◽

Shruthi Nair ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tungsten Carbide ◽

Band Gap ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Cvd Method ◽

High Band

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Self-ordering and confinement in strained InGaAs/AlGaAs V-groove quantum wires grown by low-pressure organometallic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.120850 ◽

1998 ◽

Vol 72 (6) ◽

pp. 701-703 ◽

Cited By ~ 28

Author(s):

E. Martinet ◽

F. Reinhardt ◽

A. Gustafsson ◽

G. Biasiol ◽

E. Kapon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Quantum Wires ◽

Chemical Vapor ◽

Low Pressure ◽

Organometallic Chemical Vapor Deposition

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Organometallic Chemical Vapor Deposition of Superconducting YBaCuO Films and Post-Deposition Processing

Science and Technology of Thin Film Superconductors ◽

10.1007/978-1-4684-5658-5_35 ◽

1989 ◽

pp. 295-299 ◽

Cited By ~ 2

Author(s):

J. Zhao ◽

H. O. Marcy ◽

L. M. Tonge ◽

B. W. Wessels ◽

T. J. Marks ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Post Deposition ◽

Organometallic Chemical Vapor Deposition

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Kinetics of evaporation of barium THD precursors used for organometallic chemical vapor deposition (OMCVD) thin films

Journal of Crystal Growth ◽

10.1016/s0022-0248(97)00021-3 ◽

1997 ◽

Vol 174 (1-4) ◽

pp. 801-805 ◽

Cited By ~ 7

Author(s):

V. Burtman ◽

M. Schieber ◽

S. Yitzchaik ◽

Y. Yaroslavsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Kinetics Of ◽

Organometallic Chemical Vapor Deposition

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ChemInform Abstract: Organometallic Chemical Vapor Deposition of III/V Compound Semiconductors with Novel Organometallic Precursors.

ChemInform ◽

10.1002/chin.198851274 ◽

1988 ◽

Vol 19 (51) ◽

Author(s):

A. H. COWLEY ◽

B. L. BENAC ◽

J. G. EKERDT ◽

R. A. JONES ◽

K. B. KIDD ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Compound Semiconductors ◽

Organometallic Precursors ◽

Organometallic Chemical Vapor Deposition

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Organometallic chemical vapor deposition of strontium titanate

Journal of Applied Physics ◽

10.1063/1.345034 ◽

1990 ◽

Vol 67 (8) ◽

pp. 3858-3861 ◽

Cited By ~ 49

Author(s):

W. A. Feil ◽

B. W. Wessels ◽

L. M. Tonge ◽

T. J. Marks

Keyword(s):

Chemical Vapor Deposition ◽

Strontium Titanate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organometallic Chemical Vapor Deposition

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Effects of growth interruption on the optical properties of AIGaAs/GaAs and GaAs/InGaAs quantum wells grown by atmospheric pressure organometallic chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/bf02653323 ◽

1991 ◽

Vol 20 (2) ◽

pp. 197-201 ◽

Cited By ~ 5

Author(s):

Daniel C. Bertolet ◽

Jung-Kuei Hsu ◽

Kei May Lau ◽

Emil S. Koteles

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Growth Interruption ◽

Organometallic Chemical Vapor Deposition

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High‐Tc Undoped and Pb‐Doped BI‐SR‐CA‐CU‐O thin Films Prepared by Organometallic Chemical Vapor Deposition

MRS Proceedings ◽

10.1557/proc-169-607 ◽

1989 ◽

Vol 169 ◽

Cited By ~ 2

Author(s):

J. M. Zhang ◽

H. O Marcy ◽

L .M. Tonge ◽

B. W. Wessels ◽

T. J. Marks ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

High Tc ◽

Metal Organic ◽

Organic Precursors ◽

Organometallic Chemical Vapor Deposition

AbstractFilms of the high‐Tc undoped and Pb‐doped Bi‐Sr‐Ca‐Cu‐O (BSCCO) superconductors have been prepared by low pressure organometallic chemical vapor deposition (OMCVD) using the volatile metal‐organic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate)2, Ca(dipivaloylmethanate)2, and triphenyl bismuth. Factors which influence texture and morphology of the OMCVD‐derived films have been investigated, including the effects of annealing, doping, and substrates.

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