Disorder−Order Transition in Mesoscopic Silica Thin Films

2000 ◽  
Vol 12 (6) ◽  
pp. 1536-1548 ◽  
Author(s):  
Nan Yao ◽  
Anthony Y. Ku ◽  
Nobuyoshi Nakagawa ◽  
Tu Lee ◽  
Dudley A. Saville ◽  
...  
Keyword(s):  
Thin Films ◽  
Order Transition ◽  
Silica Thin Films

Functionalized magnetite silica thin films fabricated by MAPLE with antibiofilm properties

2012 ◽  
Vol 5 (1) ◽  
pp. 015007 ◽  
Author(s):  
D E Mihaiescu ◽  
R Cristescu ◽  
G Dorcioman ◽  
C E Popescu ◽  
C Nita ◽  
...  
Keyword(s):  
Thin Films ◽  
Silica Thin Films

Photo-orientation of Mesoporous Silica Thin Films on Photocrosslinkable Polymer Films

2005 ◽  
Vol 17 (8) ◽  
pp. 1035-1039 ◽  
Author(s):  
H. Fukumoto ◽  
S. Nagano ◽  
N. Kawatsuki ◽  
T. Seki
Keyword(s):  
Thin Films ◽  
Mesoporous Silica ◽  
Polymer Films ◽  
Silica Thin Films

Humidity Effects on Porous Silica Thin Films

1995 ◽  
Vol 411 ◽  
Author(s):  
J. R. Kokan ◽  
R. A. Gerhardt
Keyword(s):  
Thin Films ◽  
Ac Conductivity ◽  
Sol Gel ◽  
Porous Silica ◽  
Controlled Environment ◽  
Alkali Ions ◽  
Humidity Effects ◽  
Silica Thin Films ◽  
Environment Chamber ◽  
Humidity Sensitivity

ABSTRACTImpedance Spectroscopy is being used to study the humidity sensitivity of porous silica thin films. The films are processed via a colloidal sol-gel method which leaves some remnant potassium and sodium. Previous work on bulk porous silica samples processed by the same method showed that the dielectric properties and ac conductivity were very sensitive to changes in humidity. The aim of this work was to determine if the same dependencies could be found in the thin films. The capacitance, dielectric loss, and ac conductivity of the films were measured in a controlled environment chamber from 20–80% RH for frequencies ranging from 10Hz–10MHz. In addition to characterizing films with varying amounts of residual alkali ions obtained through leaching, we have also measured films that were surface doped with controlled amounts of KCl, LiCl, or NaCl. Relative humidity dependencies in the films are not as dramatic as in the bulk samples. The reasons for this behavior are not yet clear, but may be associated with the porosity, thickness, and surface area of the films.

scholarly journals One-Step Synthesis of Mesoporous Silica Thin Films Containing Available COOH Groups

ACS Omega ◽  
2017 ◽  
Vol 2 (8) ◽  
pp. 4548-4555 ◽  
Author(s):  
Ane Escobar ◽  
Luis Yate ◽  
Marek Grzelczak ◽  
Heinz Amenitsch ◽  
Sergio E. Moya ◽  
...  
Keyword(s):  
Thin Films ◽  
Mesoporous Silica ◽  
Silica Thin Films ◽  
One Step

scholarly journals Synthesis of Periodic Mesoporous Silica Thin Films

1996 ◽  
Vol 431 ◽  
Author(s):  
M. T. Anderson ◽  
J. E. Martin ◽  
J. G. Odinek ◽  
P. Newcomer
Keyword(s):  
Thin Films ◽  
Mesoporous Silica ◽  
Product Formation ◽  
Coating Solution ◽  
Homogeneous Solutions ◽  
Silica Thin Films ◽  
Initial Silica ◽  
Mesoporous Thin Films ◽  
Rapid Hydrolysis ◽  
Quartz Substrates

AbstractWe have synthesized periodic mesoporous silica thin films (PMSTF) from homogeneous solutions. To synthesize the films a thin layer of a pH = 7 micellar coating solution that contains TMOS is dip- or spin-coated onto silicon wafers, borosilicate glass, or quartz substrates. Ammonia gas is diffused into the solution and causes rapid hydrolysis and condensation of the TMOS and the formation of periodic mesoporous thin films within ∼10 seconds. The combination of homogeneous solutions and rapid product formation maximizes the concentration of desired product and provides a controlled, predictable microstructure. The films have been made continuous and crack-free by optimizing initial silica concentration and film thickness.

scholarly journals Preparation of W-Containing Mesoporous Silica Thin Films and Their Surface Hydrophilic Properties

2009 ◽  
Vol 7 ◽  
pp. 141-144 ◽  
Author(s):  
Yu Horiuchi ◽  
Takashi Kamegawa ◽  
Kohsuke Mori ◽  
Hiromi Yamashita ◽  
Norikazu Nishiyama
Keyword(s):  
Thin Films ◽  
Mesoporous Silica ◽  
Silica Thin Films

scholarly journals Increasing mechanical strength of mesoporous silica thin films by addition of tetrapropylammonium hydroxide and refluxing processes

2009 ◽  
Vol 517 (6) ◽  
pp. 2039-2043 ◽  
Author(s):  
Cheng-Tsung Tsai ◽  
Hsin-Yan Lu ◽  
Chih-Yuan Ting ◽  
Wen-Fa Wu ◽  
Ben-Zu Wan
Keyword(s):  
Thin Films ◽  
Mesoporous Silica ◽  
Mechanical Strength ◽  
Tetrapropylammonium Hydroxide ◽  
Silica Thin Films
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