Nanostructured Ruthenium Oxide Electrodes via High-Temperature Molecular Templating for Use in Electrochemical Capacitors

2010 ◽  
Vol 2 (3) ◽  
pp. 778-787 ◽  
Author(s):  
Michael T. Brumbach ◽  
Todd M. Alam ◽  
Paul G. Kotula ◽  
Bonnie B. McKenzie ◽  
Bruce C. Bunker
Keyword(s):  
High Temperature ◽  
Electrochemical Capacitors ◽  
Ruthenium Oxide ◽  
Oxide Electrodes

scholarly journals Monitoring Contractile Cardiomyocytes via Impedance Using Multipurpose Thin Film Ruthenium Oxide Electrodes

Sensors ◽  
2021 ◽  
Vol 21 (4) ◽  
pp. 1433
Author(s):  
Esther Tanumihardja ◽  
Douwe S. de Bruijn ◽  
Rolf H. Slaats ◽  
Wouter Olthuis ◽  
Albert van den Berg
Keyword(s):  
Thin Film ◽  
Electrical Impedance ◽  
Ruthenium Oxide ◽  
Electrical Impedance Spectroscopy ◽  
Visual Data ◽  
Oxide Electrodes ◽  
Pt Electrodes ◽  
Mode Of Operation ◽  
Frequency Components

A ruthenium oxide (RuOx) electrode was used to monitor contractile events of human pluripotent stem cells-derived cardiomyocytes (hPSC-CMs) through electrical impedance spectroscopy (EIS). Using RuOx electrodes presents an advantage over standard thin film Pt electrodes because the RuOx electrodes can also be used as electrochemical sensor for pH, O2, and nitric oxide, providing multisensory functionality with the same electrode. First, the EIS signal was validated in an optically transparent well-plate setup using Pt wire electrodes. This way, visual data could be recorded simultaneously. Frequency analyses of both EIS and the visual data revealed almost identical frequency components. This suggests both the EIS and visual data captured the similar events of the beating of (an area of) hPSC-CMs. Similar EIS measurement was then performed using the RuOx electrode, which yielded comparable signal and periodicity. This mode of operation adds to the versatility of the RuOx electrode’s use in in vitro studies.

Effects of rare earth chlorides on the preparation of porous ruthenium oxide electrodes

1996 ◽  
Vol 239 (2) ◽  
pp. 111-113 ◽  
Author(s):  
Yasushi Murakami ◽  
Takeshi Kondo ◽  
Yoshihiro Shimoda ◽  
Hayato Kaji ◽  
Kiyochika Yahikozawa ◽  
...  
Keyword(s):  
Rare Earth ◽  
Ruthenium Oxide ◽  
Oxide Electrodes

scholarly journals Effects of the Addition of Calcium on the Pseudocapacitance of Ruthenium Oxide Electrodes

2001 ◽  
Vol 69 (6) ◽  
pp. 493-494 ◽  
Author(s):  
Yoshio TAKASU ◽  
Takeshi OHNUMA ◽  
Syunsuke MIZUTANI ◽  
Wataru SUGIMOTO ◽  
Yasushi MURAKAMI
Keyword(s):  
Ruthenium Oxide ◽  
Oxide Electrodes

High Temperature Plasma Etching of PZT Capacitor Stacks for High Density FERAMs

2002 ◽  
Vol 748 ◽  
Author(s):  
Ulrich Egger ◽  
Kazuhiro Tomioka ◽  
George Stojakovic ◽  
Yasuyuku Taniguchi ◽  
Rainer Bruchhaus ◽  
...  
Keyword(s):  
High Temperature ◽  
Lead Zirconate Titanate ◽  
Ferroelectric Properties ◽  
Ruthenium Oxide ◽  
Lead Zirconate ◽  
Temperature Plasma ◽  
Etching Profile ◽  
End Point Detection ◽  
The Individual ◽  
Point Detection

ABSTRACTA 32 Mbit chain FeRAM™ stack with 0.20μm minimum feature size was etched with two subsequent lithography/RIE steps: in mask step 1 the platinum/SRO (strontium ruthenium oxide) top electrode and the PZT (lead zirconate titanate) layer, in mask step 2 the bottom electrode together with the Ir/IrO2 diffusion barrier were etched. The stack was etched with various chlorine based chemistries. High temperature etching processes were applied to suppress residues by the formation of volatile etching byproducts resulting in a highly anisotropic etching profile and low redeposition.Profile angles of 75° for step 1 and 80° for step 2 could be achieved. For the thin SRO-layer a separate etching recipe was developed to avoid surface roughening caused by micromasking. The influence of etching temperature and different gas chemistries on the etching behavior was evaluated. Reliable end point detection and good uniformity of the individual etching processes were obtained, both being crucial for the application of a multi-step recipe. The ferroelectric properties of the capacitor were confirmed by hysteresis measurements. This demonstrates that the ferroelectric properties were conserved during RIE etch processes at high temperature.

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