Zinc Oxide Nanowire Interphase for Enhanced Interfacial Strength in Lightweight Polymer Fiber Composites

2009 ◽  
Vol 1 (8) ◽  
pp. 1827-1833 ◽  
Author(s):  
Gregory J. Ehlert ◽  
Henry A. Sodano
Author(s):  
Brendan A. Patterson ◽  
Henry A. Sodano

Vertically aligned arrays of zinc oxide nanowires can serve as an adjustable interface for fiber composites through controllable synthesis techniques. When grown on carbon fiber surfaces as a fiber-matrix interphase of a composite, ZnO nanowires increase the surface area of interaction between fiber and matrix, and thus cause a greater interfacial shear strength of the composite. The ability to control the interfacial strength of this interphase through tailored morphologies enables the design of composite systems to specific applications. This report focuses on the controlled growth of ZnO nanowires and correlates the relationship between nanowire length and interfacial shear strength of the composite. Previous studies have focused on the effects of nanowire morphology on the interfacial strength; however, the data was limited to nanowire lengths < 1μm due to problems with nanowire uniformity and cleanliness [1]. Here, a new synthesis method is applied to the growth of zinc oxide nanowires on carbon fiber that enables the production of long, vertically aligned, uniform nanowires while maintaining the tensile properties of the fiber. The nanowires created by the new method are then compared to previous method nanowires by scanning electron microscopy imaging. Lastly, the interfacial shear strength of the fiber/polymer matrix composite is tested using single fiber fragmentation and correlated to the nanowire length of each method.


Author(s):  
Brince Paul ◽  
R Ranga Reddy ◽  
Siva Rama Krishna Vanjari ◽  
Shiv Govind Singh

2013 ◽  
Vol 795 ◽  
pp. 393-396 ◽  
Author(s):  
R. Haarindra Prasad ◽  
U. Hashim ◽  
Tijjani Adam

This paper mainly represent the simple and effective method to design the chrome mask for patterning theplatformfor zinc oxide nanowire growth. The most essential aspect that need to be considered in designing the chrome mask is the critical dimension of the mask. Hence, the mask is design by usingAutoCADsoftware to design the desired size and length dimension of the mask. Fabrication and development of zinc oxide consist of a series of major steps. The silicon sample will be initially cleaned, followed by zinc oxide deposition and the zinc oxide nanowire will be growth in vertical direction by using VLS (Vapor-Liquid-Solid) mechanism. The nanowire will be patterned by using the chrome mask which design the platform of the nanowire formation. The initial design of the chrome mask is measured and compared to the fabricated chrome mask to detect the efficiency and the accuracy of the pattern transfer process. Our aim is to develop a comprehensive platform for prominent zinc oxide nanowire growth leading to novel and efficient functional of zinc oxide nanowire devices.


2011 ◽  
Vol 30 (5) ◽  
pp. 371-380 ◽  
Author(s):  
Taylor Ware ◽  
Greg Ellson ◽  
Agatha Kwasnik ◽  
Stephanie Drewicz ◽  
Ken Gall ◽  
...  

2011 ◽  
Vol 23 (2) ◽  
pp. 025501 ◽  
Author(s):  
Mrunal A Khaderbad ◽  
Youngjin Choi ◽  
Pritesh Hiralal ◽  
Atif Aziz ◽  
Nan Wang ◽  
...  

2016 ◽  
Vol 101 ◽  
pp. 362-369 ◽  
Author(s):  
Jungsu Choi ◽  
Sophia Chan ◽  
Hyunjong Joo ◽  
Heejae Yang ◽  
Frank K. Ko

2009 ◽  
Vol 94 (16) ◽  
pp. 163501 ◽  
Author(s):  
Husnu Emrah Unalan ◽  
Yan Zhang ◽  
Pritesh Hiralal ◽  
Sharvari Dalal ◽  
Daping Chu ◽  
...  

2008 ◽  
Vol 53 (4) ◽  
pp. 1992-1995 ◽  
Author(s):  
Ryong Ha ◽  
Jae-Chul Pyun ◽  
Hwangyou Oh ◽  
Heon-Jin Choi ◽  
Young-Jin Choi ◽  
...  

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