Uniform Growth of High-Quality Oxide Thin Films on Graphene Using a CdSe Quantum Dot Array Seeding Layer

2014 ◽  
Vol 6 (15) ◽  
pp. 13015-13022 ◽  
Author(s):  
Yong-Tae Kim ◽  
Seoung-Ki Lee ◽  
Kwang-Seop Kim ◽  
Yong Ho Kim ◽  
Jong-Hyun Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Quantum Dot ◽  
Oxide Thin Films ◽  
High Quality ◽  
Seeding Layer ◽  
Uniform Growth ◽  
Cdse Quantum Dot

Microstructural and optical properties of high-quality Mg–Zn oxide thin films

2021 ◽  
Vol 127 ◽  
pp. 105690
Author(s):  
A. Sáenz-Trevizo ◽  
D. Kuchle-Mena ◽  
P. Pizá-Ruiz ◽  
P. Amézaga-Madrid ◽  
O. Solís-Canto ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oxide Thin Films ◽  
High Quality

Novel Mocvd Processes for Nanoscale Oxide Thin Films

1996 ◽  
Vol 446 ◽  
Author(s):  
Tingkai Li ◽  
Pete Zawadzkp ◽  
Richard A. Stall ◽  
Yongfei Zhu ◽  
Seshu B. Desu
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Integrated Circuits ◽  
Deposition Temperature ◽  
High Dielectric Constant ◽  
Ferroelectric Properties ◽  
Oxide Thin Films ◽  
High Quality ◽  
Step Process ◽  
High Dielectric

AbstractNanoscale oxide thin films such as Ba1‐xSrxTiO3 (BST), SrBi2Ta2O9 (SBT), and PbZr1‐xTixO3 (PZT) that have a high dielectric constant and excellent ferroelectric properties have been receiving greatly increased attention, especially for high density memories in next generation integrated circuits. However, with increasing deposition temperature the surface roughness of the films increases, which results in high leakage current, and when the thickness of oxide films is decreased, the apparent bulk‐like properties of thin films tend to worsen due to the increased influence of the interface. To solve these problems, novel MOCVD techniques, plasma enhanced deposition, and a two step process, were developed for high quality oxide thin films.

scholarly journals Interface Engineering of Colloidal CdSe Quantum Dot Thin Films as Acid-Stable Photocathodes for Solar-Driven Hydrogen Evolution

2018 ◽  
Vol 10 (20) ◽  
pp. 17129-17139 ◽  
Author(s):  
Hui Li ◽  
Peng Wen ◽  
Adam Hoxie ◽  
Chaochao Dun ◽  
Shiba Adhikari ◽  
...  
Keyword(s):  
Thin Films ◽  
Quantum Dot ◽  
Hydrogen Evolution ◽  
Interface Engineering ◽  
Cdse Quantum Dot ◽  
Acid Stable

Fabrication and physical properties of high-quality zinc oxide thin films

2008 ◽  
Author(s):  
Bo Zhou ◽  
Jinliang Wang ◽  
Yadong Pan ◽  
Li Wang ◽  
Hongyong Peng
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Physical Properties ◽  
Oxide Thin Films ◽  
High Quality

scholarly journals Epitaxial Bi9Ti3Fe5O27 thin films: a new type of layer-structure room-temperature multiferroic

2017 ◽  
Vol 5 (31) ◽  
pp. 7720-7725 ◽  
Author(s):  
Xun Cao ◽  
Zhiqi Liu ◽  
Liv R. Dedon ◽  
Andrew J. Bell ◽  
Faye Esat ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
Layer Structure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
High Quality ◽  
New Type

In this communication, we report the successful growth of high-quality Aurivillius oxide thin films with m = 8 (where m denotes the number of pseudo-perovskite blocks) using pulsed laser deposition.

Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films

2017 ◽  
Vol 46 (8) ◽  
pp. 2670-2679 ◽  
Author(s):  
Sarah Karle ◽  
Detlef Rogalla ◽  
Arne Ludwig ◽  
Hans-Werner Becker ◽  
Andreas Dirk Wieck ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Chemical Solution Deposition ◽  
Free Solution ◽  
Chemical Solution ◽  
Oxide Thin Films ◽  
High Quality ◽  
Solution Deposition ◽  
P Type

A streamlined approach towards high-quality p-type CuOx nanostructures was successfully established based on rational precursor design for chemical solution deposition.

Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

2019 ◽  
Vol 7 (42) ◽  
pp. 24124-24149 ◽  
Author(s):  
Elizabeth A. Cochran ◽  
Keenan N. Woods ◽  
Darren W. Johnson ◽  
Catherine J. Page ◽  
Shannon W. Boettcher
Keyword(s):  
Thin Films ◽  
Metal Oxide ◽  
High Performance ◽  
Metal Nitrate ◽  
Oxide Thin Films ◽  
High Quality ◽  
Metal Oxide Thin Films ◽  
Solution Deposition ◽  
Energy Applications

Unique chemistries of metal-nitrate precursors that enable the preparation of high-quality, high-performance metal-oxide thin films by solution deposition are reviewed.

Sign in / Sign up

Export Citation Format

Share Document