Interface Structure and Corrosion Resistance of Ti/Cr Nanomultilayer Film Prepared by Magnetron Sputtering on Depleted Uranium

2013 ◽  
Vol 5 (14) ◽  
pp. 6598-6602 ◽  
Author(s):  
Shengfa Zhu ◽  
Yanping Wu ◽  
Tianwei Liu ◽  
Kai Tang ◽  
Qiang Wei
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Interface Structure ◽  
Depleted Uranium

scholarly journals Structure and Corrosion Behavior of Sputter-Deposited W-Mo Alloys

1970 ◽  
Vol 21 ◽  
pp. 19-25 ◽  
Author(s):  
Jagadeesh Bhattarai
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Corrosion Behavior ◽  
Solid Solutions ◽  
Chemical Society ◽  
High Corrosion Resistance ◽  
Corrosion Rates ◽  
High Corrosion ◽  
Sputter Deposited

Nanocrystalline, single bcc solid solutions of W-Mo alloys have been successfully prepared by D. C. magnetron sputtering in a wide composition. The corrosion behavior of the sputter-deposited W-Mo alloys was studied. The W-Mo alloys showed significantly high corrosion resistance in 12 M HCl at 30o C. Their corrosion rates are about one and half orders of magnitude lower than that of sputter-deposited tungsten and lower than that of the sputter-deposited molybdenum even after prolonged immersion.DOI: 10.3126/jncs.v21i0.217Journal of Nepal Chemical Society Vol.21 2006 pp.19-25

The Microstructure and Properties of CrNx Films Synthesized by Unbalanced Magnetron Sputtering

2008 ◽  
Vol 373-374 ◽  
pp. 176-179
Author(s):  
Yan Ping Wu ◽  
Yong Xiang Leng ◽  
Sun Hong ◽  
Sheng Fa Zhu ◽  
Nan Huang ◽  
...  
Keyword(s):  
Residual Stress ◽  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Corrosion Properties ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Wear And Corrosion ◽  
Structure Thickness ◽  
Wear And Corrosion Resistance ◽  
N2 Flow Rate

CrNx film was widely used in mechanical engineering field because of its excellent anti-wear and corrosion resistance properties. While most of research was focused on mechanical properties, little attention had been paid to the corrosion resistance and residual stress of CrNx film . In this paper, CrNx films were deposited on silicon wafer (100) and iron substrate by unbalanced magnetron sputtering system (UBMS) at different N2 flow. Then the structure, thickness, residual stress, micro-hardness, wear-resistance and anti-corrosion properties of CrNx films were investigated. The results showed that the phase composition of CrNx films transformed from Cr, single phase Cr2N, Cr2N and CrN coexist to single CrN with the N2 flow rate increasing. The CrNx films composed with Cr2N phase, which deposited at 6 sccm N2 flow, had the highest microhardness and had higher compressive residual stress. Whereas the CrNx films with CrN and Cr2N phase coexist had the best wear and corrosion resistance.

Influence of Niobium Dopant on the Corrosion Resistance of a-C:N and a-C:N:H Coatings

2019 ◽  
Vol 823 ◽  
pp. 75-79
Author(s):  
Yen Liang Su ◽  
Sun Hui Yao ◽  
Yi Ru Wu
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
High Speed ◽  
High Speed Steel ◽  
Test Surface ◽  
Nb Dopant ◽  
Sputtering System

Amorphous carbonitride coatings (a-C:N and a-C:N:H) with dopant of niobium (Nb) were deposited on substrates of JIS SKH51 high speed steel (HSS) by a four-target close-field unbalance magnetron sputtering system. Subsequently, they were characterized by GDOS, XRD and XPS, and their corrosion resistance was comparatively evaluated. An electro-chemical tester was used to evaluate the corrosive behavior. An SEM was used to examine the test surface. The results revealed that the Nb dopant provided improvements in the corrosive performance to both the a-C:N and a-C:N:H coatings.

Corrosion resistance of CrN thin films produced by dc magnetron sputtering

2013 ◽  
Vol 270 ◽  
pp. 150-156 ◽  
Author(s):  
A. Ruden ◽  
E. Restrepo-Parra ◽  
A.U. Paladines ◽  
F. Sequeda
Keyword(s):  
Thin Films ◽  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering

2011 ◽  
Vol 204-210 ◽  
pp. 1685-1690 ◽  
Author(s):  
Yu Qiang Chen ◽  
Fu Yi Gao ◽  
Hong Yan Peng ◽  
Hong Wei Jiang ◽  
Long Cheng Yin ◽  
...  
Keyword(s):  
Corrosion Resistance ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Nitride Film ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
Atomic Force ◽  
Tin Film ◽  
Titanium Nitride Film

A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.

Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering

2011 ◽  
Vol 686 ◽  
pp. 589-594 ◽  
Author(s):  
Sheng Lu ◽  
Liang Wen Wu ◽  
Jing Chen
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Partial Pressure ◽  
Pressure Ratio ◽  
X Ray Diffraction ◽  
X Ray ◽  
Microstructure And Properties ◽  
Az91d Magnesium Alloy ◽  
Hydrophobic Nature ◽  
Partial Pressure Ratio

By means of reaction magnetron sputtering, TiAlN ternary compound films were deposited on AZ91D magnesium alloy substrates. The influence of partial pressure ratio of N2 to Ar (N2/Ar) on the microstructure and properties of TiAlN film was explored with scanning electron microscopy (SEM), X-ray diffraction (XRD), and tests of microhardness, hydrophile and corrosion resistance. The results show that with the increase of N2/Ar partial pressure ratio from 0.5:10 to 1.5:10, Ti2N becomes the main film phase and the size of the crystals cluster decreases. As the N2/Ar ratio is as higher as 2:10, the film crystals change from Ti2N to TiN with coarse clusters. With increase of N2/Ar rate, the hardness, hydrophobic nature and corrosion resistance of the TiAlN film tend to increase.

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