Development of Inverted Organic Solar Cells with TiO2 Interface Layer by Using Low-Temperature Atomic Layer Deposition

2013 ◽  
Vol 5 (3) ◽  
pp. 713-718 ◽  
Author(s):  
Zhenhua Lin ◽  
Changyun Jiang ◽  
Chunxiang Zhu ◽  
Jie Zhang
2018 ◽  
Vol 6 (30) ◽  
pp. 8051-8059 ◽  
Author(s):  
Ermioni Polydorou ◽  
Martha Botzakaki ◽  
Charalampos Drivas ◽  
Kostas Seintis ◽  
Ilias Sakellis ◽  
...  

Atomic layer deposition of HfO2 significantly increases the efficiency and prolongs the lifetime of organic solar cells.


2010 ◽  
Vol 11 (12) ◽  
pp. 1896-1900 ◽  
Author(s):  
Smita Sarkar ◽  
Jason H. Culp ◽  
Jon T. Whyland ◽  
Margret Garvan ◽  
Veena Misra

2020 ◽  
Vol 12 (7) ◽  
pp. 8098-8106 ◽  
Author(s):  
Rohit D. Chavan ◽  
Mohammad Mahdi Tavakoli ◽  
Daniel Prochowicz ◽  
Pankaj Yadav ◽  
Shivani S. Lote ◽  
...  

2013 ◽  
Vol 5 (8) ◽  
pp. 3487-3493 ◽  
Author(s):  
Aravind Kumar Chandiran ◽  
Aswani Yella ◽  
Morgan Stefik ◽  
Leo-Philipp Heiniger ◽  
Pascal Comte ◽  
...  

2016 ◽  
Vol 4 (31) ◽  
pp. 12080-12087 ◽  
Author(s):  
Changlei Wang ◽  
Dewei Zhao ◽  
Corey R. Grice ◽  
Weiqiang Liao ◽  
Yue Yu ◽  
...  

PEALD deposition was used to reduce the effective deposition temperature of SnO2 electron selective layers without compromising the performance of perovskite solar cells.


2017 ◽  
Vol 753 ◽  
pp. 156-162 ◽  
Author(s):  
Jae Yoo Kim

The perovskite solar cells (PSCs) with Al2O3 passivation layer were fabricated and characterized. The PSC have some advantages of easier and cheaper fabrication process than that of conventional Si solar cells, III-V compound semiconductor solar cells, and organic solar cells. The perovskite light harvester, CH3NH3PbI3, was deposited by vapor deposition on [compact TiO2 / F-doped tin oxide (FTO) / glass]. The advantage of vapor deposition over solution process is expected to be able to offer the thin film with smoother surface over larger area. Then, Al2O3 passivation layer was deposited by atomic layer deposition (ALD) on the CH3NH3PbI3 light harvester. Al2O3 passivation layer was expected to prevent the CH3NH3PbI3 light harvester from oxidation and improve the solar cell efficiency, and ALD has been one of the most effective methods to deposit Al2O3 thin film for last 25 years. The atomic layer deposited Al2O3 layer thickness was optimized from the solar cell characterization. The optimized power conversion efficiency (PCE) and Al2O3 thickness were ~8.0 % and ~10.0 nm, respectively.


2007 ◽  
Vol 90 (25) ◽  
pp. 253511 ◽  
Author(s):  
W. J. Potscavage ◽  
S. Yoo ◽  
B. Domercq ◽  
B. Kippelen

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