Photoluminescence and Hydrogen Gas-Sensing Properties of Titanium Dioxide Nanostructures Synthesized by Hydrothermal Treatments

2012 ◽  
Vol 4 (3) ◽  
pp. 1656-1665 ◽  
Author(s):  
Lucky M. Sikhwivhilu ◽  
Siyasanga Mpelane ◽  
Bonex W. Mwakikunga ◽  
Suprakas Sinha Ray
2018 ◽  
Vol 43 (50) ◽  
pp. 22756-22764 ◽  
Author(s):  
Stanislav Haviar ◽  
Jiří Čapek ◽  
Šárka Batková ◽  
Nirmal Kumar ◽  
Filip Dvořák ◽  
...  

2019 ◽  
Vol 806 ◽  
pp. 1052-1059 ◽  
Author(s):  
Zhong Li ◽  
ZhengJun Yao ◽  
Azhar Ali Haidry ◽  
Tomas Plecenik ◽  
Branislav Grancic ◽  
...  

2012 ◽  
Vol 258 (20) ◽  
pp. 7839-7843 ◽  
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J. Sithole ◽  
B.D. Ngom ◽  
S. Khamlich ◽  
E. Manikanadan ◽  
N. Manyala ◽  
...  

2016 ◽  
Vol 42 (9) ◽  
pp. 11490-11495 ◽  
Author(s):  
Muhammad Mansha ◽  
Ahsanulhaq Qurashi ◽  
Nisar Ullah ◽  
Fatai Olawale Bakare ◽  
Ibrahim Khan ◽  
...  

2010 ◽  
Vol 21 (16) ◽  
pp. 165503 ◽  
Author(s):  
Young Tack Lee ◽  
Jun Min Lee ◽  
Yeon Ju Kim ◽  
Jin Hyoun Joe ◽  
Wooyoung Lee

2016 ◽  
Vol 22 (4) ◽  
pp. 730-736 ◽  
Author(s):  
Sunghoon Park ◽  
Hyejoon Kheel ◽  
Gun-Joo Sun ◽  
Hyoun Woo Kim ◽  
Taegyung Ko ◽  
...  

Open Physics ◽  
2011 ◽  
Vol 9 (5) ◽  
Author(s):  
Azhar Haidry ◽  
Peter Schlosser ◽  
Pavol Durina ◽  
Marian Mikula ◽  
Milan Tomasek ◽  
...  

AbstractTitanium dioxide thin films are extensively studied for applications in solid state gas sensor devices. Their gas sensing properties are strongly dependent on deposition technique, annealing temperature, film thickness and consequent properties like crystalline structure, grain size or amount of defects and impurities. In this work we report the gas sensing properties of TiO2 thin films prepared by reactive magnetron sputtering technique and subsequently annealed at temperatures 600°C and 900°C. The films were exposed to different concentrations of H2 gas up to 10 000 ppm. Their sensitivity to gas at various operating temperatures, ranging from 250°C to 450°C, was obtained by measuring their resistance.


2011 ◽  
Vol 172 (1) ◽  
pp. 9-14 ◽  
Author(s):  
J. Yu ◽  
G. Chen ◽  
C.X. Li ◽  
M. Shafiei ◽  
J.Z. Ou ◽  
...  

2015 ◽  
Vol 211 ◽  
pp. 537-543 ◽  
Author(s):  
Yunjie Liu ◽  
Lanzhong Hao ◽  
Wei Gao ◽  
Zhipeng Wu ◽  
Yali Lin ◽  
...  

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