Interfacial Reaction and Electrical Properties of HfO2 Film Gate Dielectric Prepared by Pulsed Laser Deposition in Nitrogen: Role of Rapid Thermal Annealing and Gate Electrode

2011 ◽  
Vol 3 (10) ◽  
pp. 3813-3818 ◽  
Author(s):  
Yi Wang ◽  
Hao Wang ◽  
Cong Ye ◽  
Jun Zhang ◽  
Hanbin Wang ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Interfacial Reaction ◽  
Rapid Thermal Annealing ◽  
Gate Dielectric ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Hfo2 Film

scholarly journals Synthesis of vanadium oxides by pulsed laser deposition and rapid thermal annealing

2020 ◽  
Vol 521 ◽  
pp. 146267 ◽  
Author(s):  
Erieta-Katerina Koussi ◽  
Florent Bourquard ◽  
Teddy Tite ◽  
Damien Jamon ◽  
Florence Garrelie ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Pulsed Laser ◽  
Vanadium Oxides ◽  
Laser Deposition

Role of target conditioning on the thermo-optical response of bismuth nanostructures produced by pulsed laser deposition

2012 ◽  
Vol 110 (4) ◽  
pp. 863-867 ◽  
Author(s):  
R. Serna ◽  
M. Jiménez de Castro ◽  
J. Toudert ◽  
E. Haro-Poniatowski ◽  
J. García López
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Optical Response ◽  
Laser Deposition
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