Mechanism of Photolytic Decomposition of N-Halamine Antimicrobial Siloxane Coatings

2010 ◽  
Vol 2 (8) ◽  
pp. 2456-2464 ◽  
Author(s):  
Hasan B. Kocer ◽  
Akin Akdag ◽  
S. D. Worley ◽  
Orlando Acevedo ◽  
R. M. Broughton ◽  
...  
Keyword(s):  
Photolytic Decomposition

Laser-Induced Selective Copper Deposition on Polyimides and Semiconductors

1992 ◽  
Vol 282 ◽  
Author(s):  
Seong-Don Hwang ◽  
S. S. Kher ◽  
J. T. Spencer ◽  
P. A. Dowben
Keyword(s):  
Gas Phase ◽  
Copper Chloride ◽  
Copper Deposition ◽  
Copper Films ◽  
Liquid Phase Deposition ◽  
Metal Thin Films ◽  
Selective Area ◽  
Phase Cluster ◽  
Photolytic Decomposition ◽  
Area Deposition

ABSTRACTIt has been demonstrated that copper can be selectively deposited on a variety of substrates including Teflon (polytetrafluroethylene or PTFE), Kapton (polyimide resin), silicon and gallium arsnide from solution by photo-assisted initiated deposition. A copper containing solution was prepared from a mixture of copper(I) chloride (Cu2Ci2) and decaborane (B10H14) in diethyl ether and/or THF (tetrahydrofuran). The copper films were fabricated by ultraviolet photolytic decomposition of copper chloride and polyhedral borane clusters. This liquid phase deposition has a gas-phase cluster analog that also results in copper deposition via pyrolysis. The approach of depositing metal thin films selectively by pholysis from solution is a novel and an underutilized approach to selective area deposition.

The photolysis of hexafluoroacetone

1956 ◽  
Vol 234 (1199) ◽  
pp. 476-488 ◽  
Keyword(s):  
Quantum Yield ◽  
Initial Step ◽  
Excited Molecule ◽  
Inert Gases ◽  
Wide Range ◽  
Electronically Excited ◽  
Photolytic Decomposition ◽  
Long Lifetime ◽  
The Stability ◽  
Excellent Source

The photolytic decomposition of hexafluoroacetone has been studied over a wide range of temperatures and pressures using light of wavelength 3130 Å. The initial step involves the production of CF 3 radicals, and the only products are C 2 F 6 and CO. The reaction is an excellent source of CF 3 radicals. The quantum yield diminishes with increasing pressure. A mechanism is suggested involving the participation of an electronically excited molecule of comparatively long lifetime, and the effect of various inert gases on the stability of this species is discussed.

scholarly journals A comparison of HONO budgets for two measurement heights at a field station within the boreal forest in Finland

2015 ◽  
Vol 15 (2) ◽  
pp. 799-813 ◽  
Author(s):  
R. Oswald ◽  
M. Ermel ◽  
K. Hens ◽  
A. Novelli ◽  
H. G. Ouwersloot ◽  
...  
Keyword(s):  
Boreal Forest ◽  
Gas Phase Reactions ◽  
Additional Source ◽  
Forest Environment ◽  
Field Station ◽  
Photostationary State ◽  
Unknown Source ◽  
Unidentified Source ◽  
Photolytic Decomposition ◽  
Atmospheric Concentrations

Abstract. Atmospheric concentrations of nitrous acid (HONO), one of the major precursors of the hydroxyl radical (OH) in the troposphere, significantly exceed the values predicted by the assumption of a photostationary state (PSS) during daytime. Therefore, additional sources of HONO were intensively investigated in the last decades. This study presents budget calculations of HONO based on simultaneous measurements of all relevant species, including HONO and OH at two different measurement heights, i.e. 1 m above the ground and about 2 to 3 m above the canopy (24 m above the ground), conducted in a boreal forest environment. We observed mean HONO concentrations of about 6.5 × 108 molecules cm−3 (26 ppt) during daytime, more than 20 times higher than expected from the PSS of 0.2 × 108 molecules cm−3 (1 ppt). To close the budgets at both heights, a strong additional source term during daytime is required. This unidentified source is at its maximum at noon (up to 1.1 × 106 molecules cm−3 s−1, 160 ppt h−1) and in general up to 2.3 times stronger above the canopy than close to the ground. The insignificance of known gas phase reactions and other processes like dry deposition or advection compared to the photolytic decomposition of HONO at this measurement site was an ideal prerequisite to study possible correlations of this unknown term to proposed HONO sources. But neither the proposed emissions from soils nor the proposed photolysis of adsorbed HNO3 contributed substantially to the unknown source. However, the unknown source was found to be perfectly correlated to the unbalanced photolytic loss of HONO.

Thermal and Photolytic Decomposition of Adsorbed Cadmium and Tellurium Alkyls

1988 ◽  
Vol 129 ◽  
Author(s):  
C.D. Stinespring ◽  
A. Freedman
Keyword(s):  
Surface Chemistry ◽  
Ultrahigh Vacuum ◽  
Photolytic Decomposition ◽  
Substrate Temperatures

ABSTRACTStudies of the thermal and photon-induced surface chemistry of dimethyl cadmium (DMCd) and dimethyl tellurium (DMTe) under ultrahigh vacuum conditions have been performed for substrate temperatures in the range of 133 K to 295 K. Results on GaAs(100) and Si(100) surfaces indicate that for DMTe, the predominant adspecies, dimethyl tellurium, can be photodissociated to a metal adspecies at both 193 and 248 nm. For DHCd, the major adspecies, monomethyl cadmium, is unreactive to photon stimulation.

Thermal and photolytic decomposition of alkoxy-lead(IV)-acetates derived from saturated aliphatic alcohols

Tetrahedron ◽  
1969 ◽  
Vol 25 (11) ◽  
pp. 2269-2273 ◽  
Author(s):  
M.Lj. Mihallović ◽  
M. Jakovjević ◽  
Ž. Čeković
Keyword(s):  
Aliphatic Alcohols ◽  
Photolytic Decomposition
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