scholarly journals The Coalescence Behavior of Two-Dimensional Materials Revealed by Multiscale In Situ Imaging during Chemical Vapor Deposition Growth

ACS Nano ◽  
2020 ◽  
Vol 14 (2) ◽  
pp. 1902-1918 ◽  
Author(s):  
Zhu-Jun Wang ◽  
Jichen Dong ◽  
Linfei Li ◽  
Guocai Dong ◽  
Yi Cui ◽  
...  
2021 ◽  
Vol 54 (4) ◽  
pp. 1011-1022
Author(s):  
Kongyang Yi ◽  
Donghua Liu ◽  
Xiaosong Chen ◽  
Jun Yang ◽  
Dapeng Wei ◽  
...  

Science ◽  
2020 ◽  
Vol 369 (6504) ◽  
pp. 670-674 ◽  
Author(s):  
Yi-Lun Hong ◽  
Zhibo Liu ◽  
Lei Wang ◽  
Tianya Zhou ◽  
Wei Ma ◽  
...  

Identifying two-dimensional layered materials in the monolayer limit has led to discoveries of numerous new phenomena and unusual properties. We introduced elemental silicon during chemical vapor deposition growth of nonlayered molybdenum nitride to passivate its surface, which enabled the growth of centimeter-scale monolayer films of MoSi2N4. This monolayer was built up by septuple atomic layers of N-Si-N-Mo-N-Si-N, which can be viewed as a MoN2 layer sandwiched between two Si-N bilayers. This material exhibited semiconducting behavior (bandgap ~1.94 electron volts), high strength (~66 gigapascals), and excellent ambient stability. Density functional theory calculations predict a large family of such monolayer structured two-dimensional layered materials, including semiconductors, metals, and magnetic half-metals.


2019 ◽  
Vol 62 (10) ◽  
pp. 1300-1311 ◽  
Author(s):  
Wei Han ◽  
Kailang Liu ◽  
Sanjun Yang ◽  
Fakun Wang ◽  
Jianwei Su ◽  
...  

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