scholarly journals Influence of the Cation Ratio on Optical and Electrical Properties of Amorphous Zinc-Tin-Oxide Thin Films Grown by Pulsed Laser Deposition

2016 ◽  
Vol 18 (4) ◽  
pp. 188-194 ◽  
Author(s):  
Sofie Bitter ◽  
Peter Schlupp ◽  
Michael Bonholzer ◽  
Holger von Wenckstern ◽  
Marius Grundmann
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Optical And Electrical Properties ◽  
Oxide Thin Films ◽  
Zinc Tin Oxide ◽  
Cation Ratio

Amorphous zinc-tin oxide thin films fabricated by pulsed laser deposition at room temperature

2014 ◽  
Vol 1633 ◽  
pp. 101-104 ◽  
Author(s):  
P. Schlupp ◽  
H. von Wenckstern ◽  
M. Grundmann
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Amorphous Materials ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Growth Pressure ◽  
Zinc Tin Oxide

ABSTRACTFor a cost-efficient fabrication of homogeneous oxide thin films the usage of amorphous materials is favorable. They can be deposited at room temperature (RT) and represent an interesting alternative to amorphous silicon in electronics. Zinc-tin oxide is a promising n-type channel material for thin film transistors and consists of abundant elements, only, in contrast to the well-explored indium gallium zinc oxide. Here, the electrical and optical properties of room temperature deposited ZTO thin films are discussed. These films were fabricated via pulsed-laser deposition on glass substrates by ablating a ceramic target composed of ZnO and SnO2 in a 1:2 ratio. The resistivity has been controlled over seven orders of magnitude via the oxygen growth pressure. Further, the optical transmittance tends to be higher for higher oxygen growth pressures.

Pulsed Laser Deposition of Low-Resistivity Indium Tin Oxide Thin Films at Low Substrate Temperature

1999 ◽  
Vol 38 (Part 1, No. 5A) ◽  
pp. 2710-2716 ◽  
Author(s):  
Frederick Ojo Adurodija ◽  
Hirokazu Izumi ◽  
Tsuguo Ishihara ◽  
Hideki Yoshioka ◽  
Hiroshi Matsui ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Low Resistivity

Pulsed laser deposition of conductive indium tin oxide thin films

2012 ◽  
Vol 48 (10) ◽  
pp. 1020-1025 ◽  
Author(s):  
I. A. Petukhov ◽  
A. N. Shatokhin ◽  
F. N. Putilin ◽  
M. N. Rumyantseva ◽  
V. F. Kozlovskii ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films
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