Strain-Induced Nanocavitation in Block Copolymer Thin Films for High Performance Filtration Membranes

2021 ◽  
Author(s):  
Daniel W. Weller ◽  
Guorong Ma ◽  
Luke A. Galuska ◽  
Song Zhang ◽  
Michael Stringer ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
High Performance ◽  
Filtration Membranes

Self-Assembled Block Copolymer Thin Films as Water Filtration Membranes

2010 ◽  
Vol 2 (3) ◽  
pp. 847-853 ◽  
Author(s):  
William A. Phillip ◽  
Brandon O’Neill ◽  
Marc Rodwogin ◽  
Marc A. Hillmyer ◽  
E. L. Cussler
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Water Filtration ◽  
Filtration Membranes ◽  
Self Assembled

Synergistic local toughening of high performance epoxy-matrix composites using blended block copolymer-thermoplastic thin films

2016 ◽  
Vol 91 ◽  
pp. 398-405 ◽  
Author(s):  
Amir Bahrami ◽  
François Cordenier ◽  
Pascal Van Velthem ◽  
Wael Ballout ◽  
Thomas Pardoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Epoxy Matrix ◽  
High Performance ◽  
Matrix Composites

scholarly journals High performance, electroforming-free, thin film memristors using ionic Na0.5Bi0.5TiO3

2021 ◽  
Vol 9 (13) ◽  
pp. 4522-4531
Author(s):  
Chao Yun ◽  
Matthew Webb ◽  
Weiwei Li ◽  
Rui Wu ◽  
Ming Xiao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Resistive Switching ◽  
Growth Temperature ◽  
High Performance ◽  
20 Nm

Interfacial resistive switching and composition-tunable RLRS are realized in ionically conducting Na0.5Bi0.5TiO3 thin films, allowing optimised ON/OFF ratio (>104) to be achieved with low growth temperature (600 °C) and low thickness (<20 nm).

In-situ growth of high-performance (Ag, Sn) co-doped CoSb3 thermoelectric thin films

2021 ◽  
Author(s):  
Zhuang-Hao Zheng ◽  
Jun-Yun Niu ◽  
Dong-Wei Ao ◽  
Bushra Jabar ◽  
Xiao-Lei Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
High Performance ◽  
In Situ Growth ◽  
Thermoelectric Thin Films ◽  
Co Doped

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

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