A Symmetric Tunnel Field-Effect Transistor Based on MoS2/Black Phosphorus/MoS2 Nanolayered Heterostructures

2019 ◽  
Vol 2 (9) ◽  
pp. 5674-5680 ◽  
Author(s):  
Xixi Jiang ◽  
Xinyao Shi ◽  
Min Zhang ◽  
Yarong Wang ◽  
Zhenghao Gu ◽  
...  
Keyword(s):  
Field Effect ◽  
Field Effect Transistor ◽  
Black Phosphorus ◽  
Effect Transistor ◽  
Tunnel Field Effect Transistor

scholarly journals Thickness-controlled black phosphorus tunnel field-effect transistor for low-power switches

2020 ◽  
Vol 15 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Seungho Kim ◽  
Gyuho Myeong ◽  
Wongil Shin ◽  
Hongsik Lim ◽  
Boram Kim ◽  
...  
Keyword(s):  
Low Power ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Black Phosphorus ◽  
Power Switches ◽  
Effect Transistor ◽  
Tunnel Field Effect Transistor

Simulation of Gate-All-Around Tunnel Field-Effect Transistor with an n-Doped Layer

2010 ◽  
Vol E93-C (5) ◽  
pp. 540-545 ◽  
Author(s):  
Dong Seup LEE ◽  
Hong-Seon YANG ◽  
Kwon-Chil KANG ◽  
Joung-Eob LEE ◽  
Jung Han LEE ◽  
...  
Keyword(s):  
Field Effect ◽  
Field Effect Transistor ◽  
Effect Transistor ◽  
Tunnel Field Effect Transistor

scholarly journals A Study on the Effect of the Structural Parameters and Internal Mechanism of a Bilateral Gate-Controlled S/D Symmetric and Interchangeable Bidirectional Tunnel Field Effect Transistor

2021 ◽  
Vol 16 (1) ◽  
Author(s):  
Xiaoshi Jin ◽  
Yicheng Wang ◽  
Kailu Ma ◽  
Meile Wu ◽  
Xi Liu ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Structural Parameters ◽  
Cmos Integrated Circuits ◽  
Region Length ◽  
Internal Mechanism ◽  
Effect Transistor ◽  
Tunnel Field Effect Transistor ◽  
Switching Characteristics

AbstractA bilateral gate-controlled S/D symmetric and interchangeable bidirectional tunnel field effect transistor (B-TFET) is proposed in this paper, which shows the advantage of bidirectional switching characteristics and compatibility with CMOS integrated circuits compared to the conventional asymmetrical TFET. The effects of the structural parameters, e.g., the doping concentrations of the N+ region and P+ region, length of the N+ region and length of the intrinsic region, on the device performances, e.g., the transfer characteristics, Ion–Ioff ratio and subthreshold swing, and the internal mechanism are discussed and explained in detail.

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