Atomic Layer Deposition of High-Quality Al2O3 Thin Films on MoS2 with Water Plasma Treatment

2019 ◽  
Vol 11 (38) ◽  
pp. 35438-35443 ◽  
Author(s):  
Binjie Huang ◽  
Minrui Zheng ◽  
Yunshan Zhao ◽  
Jing Wu ◽  
John T. L. Thong
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

2014 ◽  
Vol 565 ◽  
pp. 19-24 ◽  
Author(s):  
Lauri Aarik ◽  
Tõnis Arroval ◽  
Raul Rammula ◽  
Hugo Mändar ◽  
Väino Sammelselg ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
High Quality ◽  
Doped Tio2 ◽  
Layer Deposition

scholarly journals A Low Cost, High Efficiency TMA-Replacement for the Deposition of High-Quality Aluminum Nitride by Atomic Layer Deposition

2020 ◽  
Author(s):  
Sydney Buttera ◽  
Polla Rouf ◽  
Petro Deminskyi ◽  
Nathan O'Brien ◽  
Sean Barry ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
High Efficiency ◽  
Low Cost ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Synthesis, characterization, and use of an amidoalane precursor for the deposition of high-quality and low-impurity aluminum nitride films by atomic layer deposition. This study highlights the importance of smart precursor design in order to deposit high-quality thin films at low cost and high efficiency.

scholarly journals Resolving impurities in atomic layer deposited aluminum nitride through low cost, high efficiency precursor design

2020 ◽  
Author(s):  
Sydney Buttera ◽  
Polla Rouf ◽  
Petro Deminskyi ◽  
Nathan O'Brien ◽  
Henrik Pedersen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
High Efficiency ◽  
Low Cost ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Synthesis, characterization, and use of an amidoalane precursor for the deposition of high-quality and low-impurity aluminum nitride films by atomic layer deposition. This study highlights the importance of smart precursor design in order to deposit high-quality thin films at low cost and high efficiency.

scholarly journals Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor

2016 ◽  
Vol 4 (10) ◽  
pp. 1945-1952 ◽  
Author(s):  
Shinjita Acharya ◽  
Jan Torgersen ◽  
Yongmin Kim ◽  
Joonsuk Park ◽  
Peter Schindler ◽  
...  
Keyword(s):  
Thin Films ◽  
Barium Titanate ◽  
Atomic Layer Deposition ◽  
Barium Oxide ◽  
Atomic Layer ◽  
High Quality ◽  
Planar Structures ◽  
Layer Deposition

Self-limiting growth of high quality binary BaO and BaTiO3 using a novel class of Ba precursor at lowest temperature ever reported and shown to cover non planar structures.

Hot-Wire-Assisted Atomic Layer Deposition of High-Quality Ru Thin Films in the Absence of Oxidization

2020 ◽  
Vol 9 (2) ◽  
pp. 024010
Author(s):  
Guangjie Yuan ◽  
Hideharu Shimizu ◽  
Takeshi Momose ◽  
Yukihiro Shimogaki
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hot Wire ◽  
High Quality ◽  
Layer Deposition
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