Direct Probing of Cross-Plane Thermal Properties of Atomic Layer Deposition Al2O3/ZnO Superlattice Films with an Improved Figure of Merit and Their Cross-Plane Thermoelectric Generating Performance

2018 ◽  
Vol 10 (51) ◽  
pp. 44472-44482 ◽  
Author(s):  
No-Won Park ◽  
Won-Yong Lee ◽  
Yo-Seop Yoon ◽  
Jay-Young Ahn ◽  
Jung-Hoon Lee ◽  
...  
Keyword(s):  
Thermal Properties ◽  
Atomic Layer Deposition ◽  
Figure Of Merit ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Comparison of the Growth and Thermal Properties of Nonwoven Polymers after Atomic Layer Deposition and Vapor Phase Infiltration

Coatings ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 1028
Author(s):  
Laura Keskiväli ◽  
Pirjo Heikkilä ◽  
Eija Kenttä ◽  
Tommi Virtanen ◽  
Hille Rautkoski ◽  
...  
Keyword(s):  
Thermal Properties ◽  
Electron Microscope ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Scanning Transmission Electron Microscope ◽  
Scanning Calorimetry ◽  
Polymeric Surfaces ◽  
Transmission Electron ◽  
Layer Deposition ◽  
Scanning Transmission

The growth mechanism of Atomic Layer Deposition (ALD) on polymeric surfaces differs from growth on inorganic solid substrates, such as silicon wafer or glass. In this paper, we report the growth experiments of Al2O3 and ZnO on nonwoven poly-L-lactic acid (PLLA), polyethersulphone (PES) and cellulose acetate (CA) fibres. Material growth in both ALD and infiltration mode was studied. The structures were examined with a scanning electron microscope (SEM), scanning transmission electron microscope (STEM), attenuated total reflectance-fourier-transform infrared spectroscopy (ATR-FTIR) and 27Al nuclear magnetic resonance (NMR). Furthermore, thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC) analysis were used to explore the effect of ALD deposition on the thermal properties of the CA polymer. According to the SEM, STEM and ATR-FTIR analysis, the growth of Al2O3 was more uniform than ZnO on each of the polymers studied. In addition, according to ATR-FTIR spectroscopy, the infiltration resulted in interactions between the polymers and the ALD precursors. Thermal analysis (TGA/DSC) revealed a slower depolymerization process and better thermal resistance upon heating both in ALD-coated and infiltrated fibres, more pronounced on the latter type of structures, as seen from smaller endothermic peaks on TA.

scholarly journals Thermal Ranges and Figures of Merit for Gold-Containing Precursors For ALD

2020 ◽  
Author(s):  
Matthew Griffiths ◽  
Zachary Dubrawski ◽  
Peter Gordon ◽  
Marcel Junige ◽  
Sean Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Vapour Deposition ◽  
Figure Of Merit ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thermal Characteristics ◽  
Atomic Layer ◽  
Figures Of Merit ◽  
Layer Deposition

A survey of known gold-containing chemical vapour deposition (CVD) and atomic layer deposition (ALD) precursors, with a focus on collecting their volatilization and decomposition data. These data were applied to a figure of merit (σ) developed to easily assess the thermal characteristics.

scholarly journals Thermal Ranges and Figures of Merit for Gold-Containing Precursors For ALD

2020 ◽  
Author(s):  
Matthew Griffiths ◽  
Zachary Dubrawski ◽  
Peter Gordon ◽  
Marcel Junige ◽  
Sean Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Vapour Deposition ◽  
Figure Of Merit ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thermal Characteristics ◽  
Atomic Layer ◽  
Figures Of Merit ◽  
Layer Deposition

A survey of known gold-containing chemical vapour deposition (CVD) and atomic layer deposition (ALD) precursors, with a focus on collecting their volatilization and decomposition data. These data were applied to a figure of merit (σ) developed to easily assess the thermal characteristics.

Thermal properties of TiO2 films grown by atomic layer deposition

2012 ◽  
Vol 520 (16) ◽  
pp. 5442-5446 ◽  
Author(s):  
M.R. Saleem ◽  
P. Silfsten ◽  
S. Honkanen ◽  
J. Turunen
Keyword(s):  
Thermal Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition

Tunable Dielectric and Thermal Properties of Oxide Dielectrics via Substrate Biasing in Plasma-Enhanced Atomic Layer Deposition

2020 ◽  
Vol 12 (40) ◽  
pp. 44912-44918
Author(s):  
Yoonjin Kim ◽  
Heungdong Kwon ◽  
Hyun Soo Han ◽  
Hyo Jin K. Kim ◽  
Brian S. Y. Kim ◽  
...  
Keyword(s):  
Thermal Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Dielectric And Thermal Properties

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition
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