Vertical-Tunnel Field-Effect Transistor Based on a Silicon–MoS2 Three-Dimensional–Two-Dimensional Heterostructure
2018 ◽
Vol 10
(46)
◽
pp. 40212-40218
◽
2018 ◽
Vol 17
(2)
◽
pp. 713-723
◽
2016 ◽
Vol 90
◽
pp. 176-183
◽
2013 ◽
Vol 52
(4R)
◽
pp. 044303
◽
2017 ◽
Vol 56
(5)
◽
pp. 054201
◽
1982 ◽
Vol 15
(3)
◽
pp. L21-L30
◽
2017 ◽
Vol 9
(1)
◽
pp. 01030-1-01030-4
◽