Tuning the Ignition Performance of a Microchip Initiator by Integrating Various Al/MoO3 Reactive Multilayer Films on a Semiconductor Bridge

2017 ◽  
Vol 9 (6) ◽  
pp. 5580-5589 ◽  
Author(s):  
Jianbing Xu ◽  
Yu Tai ◽  
Chengbo Ru ◽  
Ji Dai ◽  
Yinghua Ye ◽  
...  
Keyword(s):  
Multilayer Films ◽  
Reactive Multilayer Films

Synthesis and characterization of Ti/Al reactive multilayer films with various molar ratios

2017 ◽  
Vol 631 ◽  
pp. 99-105 ◽  
Author(s):  
Seema Sen ◽  
Markus Lake ◽  
Johannes Wilden ◽  
Peter Schaaf
Keyword(s):  
Multilayer Films ◽  
Synthesis And Characterization ◽  
Molar Ratios ◽  
Reactive Multilayer Films

scholarly journals Combined Properties of Al/Ni Reactive Multilayer Films During High-Rate Heating Using a Pulse of Current

2020 ◽  
Vol 1637 ◽  
pp. 012001
Author(s):  
Yao Wang ◽  
Fei Guo ◽  
Qin Zhou ◽  
Hongchuan Jiang ◽  
Yong Li ◽  
...  
Keyword(s):  
Multilayer Films ◽  
High Rate ◽  
Reactive Multilayer Films

Preparation of Thick Ni/Al Reactive Multilayer Films and Prospective Use for Self-Powered Brazing of Ti-6Al-4V

2018 ◽  
Author(s):  
Denzel Bridges ◽  
Ying Ma ◽  
Cary Smith ◽  
Zhili Zhang ◽  
Anming Hu ◽  
...  
Keyword(s):  
High Speed ◽  
Dendritic Structure ◽  
Propagation Speed ◽  
Multilayer Films ◽  
Rapid Melting ◽  
Substrate Preheating ◽  
Self Powered ◽  
Peeling Off ◽  
Reactive Multilayer Films ◽  
Melting And Solidification

In this study we demonstrate a new method for depositing thick reactive multilayer films (RMFs) (thickness > 14 μm) by using Ti interlayer integration and substrate preheating during fabrication. These two adjustments are designed to alleviate internal planar stresses that cause delamination between deposited layers and peeling off the substrate. Decreasing the distance between Ti interlayers helps to eliminate delamination between deposited layers. Through high speed camera measurements, the reaction propagation speed of an RMF sample with preheating is 42% slower than the same RMF that was not preheated, indicating a slower heat release rate. The preliminary experiments on brazing Ti-6Al-4V coated with BAlSi-4 brazing material revealed dendritic structure branching out from the RMF surface into the brazing material. The dendrite structures most likely form because of rapid melting and solidification of the brazing material. However, this rapid melting and solidification cycle does not appear to occur uniformly across the BAlSi-4RMF interface which is linked to its low bonding strength. When the Ti-6Al-4V substrate is heated to 150 °C prior to ignition, the strength increases to 0.47 MPa when the total RMF thickness is 84 μm and 15 MPa of pressure is applied.

Energetic igniters realized by integrating Al/CuO reactive multilayer films with Cr films

2011 ◽  
Vol 110 (7) ◽  
pp. 074513 ◽  
Author(s):  
Peng Zhu ◽  
Ruiqi Shen ◽  
Yinghua Ye ◽  
Xiang Zhou ◽  
Yan Hu
Keyword(s):  
Multilayer Films ◽  
Reactive Multilayer Films

Dielectric structure pyrotechnic initiator realized by integrating Ti/CuO-based reactive multilayer films

2011 ◽  
Vol 109 (8) ◽  
pp. 084523 ◽  
Author(s):  
Peng Zhu ◽  
Ruiqi Shen ◽  
N. N. Fiadosenka ◽  
Yinghua Ye ◽  
Yan Hu
Keyword(s):  
Multilayer Films ◽  
Dielectric Structure ◽  
Reactive Multilayer Films

Experimental and modeling investigation on the self-propagating combustion behavior of Al-MoO3 reactive multilayer films

2018 ◽  
Vol 123 (23) ◽  
pp. 235302 ◽  
Author(s):  
Yu Tai ◽  
Jianbing Xu ◽  
Fei Wang ◽  
Ji Dai ◽  
Wei Zhang ◽  
...  
Keyword(s):  
Multilayer Films ◽  
The Self ◽  
Combustion Behavior ◽  
Reactive Multilayer Films

Femtosecond laser interactions with Co/Al multilayer films

2004 ◽  
Vol 850 ◽  
Author(s):  
Yoosuf N. Picard ◽  
David P. Adams ◽  
Steven M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Femtosecond Pulse ◽  
Pulse Length ◽  
Multilayer Films ◽  
Laser Machining ◽  
Nanosecond Lasers ◽  
Extent Of Damage ◽  
Metal Layers ◽  
Reactive Multilayer Films ◽  
Scanning Electron

ABSTRACTReactive multilayer films of Co and Al were irradiated using femtosecond and nanosecond pulse-length lasers. While no ignition of a self-propagation reaction occurred during the laser machining studies, we observe considerable differences in the morphology and extent of damage induced by femtosecond and nanosecond lasers. Using scanning electron microscopy, we show that single metal layers can be removed at the micron scale with negligible damage to the underlying layers using femtosecond pulse-length lasers.

Fabrication and Characterization of Al/Ni Multilayer Films

2015 ◽  
Vol 1088 ◽  
pp. 76-80
Author(s):  
Tao Ma ◽  
Qing Xuan Zeng ◽  
Ming Yu Li ◽  
Tao Wang
Keyword(s):  
Multilayer Film ◽  
Multilayer Films ◽  
Atomic Ratio ◽  
Thickness Ratio ◽  
Nickel Layer ◽  
Total Thickness ◽  
Exothermic Reactions ◽  
Fabrication And Characterization ◽  
Reactive Multilayer Films

Self-propagating exothermic formation reactions have been intensively studied in a variety of reactive multilayer films, which typically include alternating layers of two or more reactants. Here, we introduce a reactive multilayer film which contains a thermite reaction between Ni and Al.Al/Ni multilayer films which were composed of alternate Al and Ni layers were prepared by DC magnetron sputtering.The total thickness of each films was approximately 1.2 μm having bilayer thicknesses of 60, 100, 150 nm. Each bilayer consisted of an aluminum layer and a nickel layer in a 3:2 thickness ratio to maintain an overall 1:1 atomic composition.Meanwhile, Al/Ni multilayer films with the bilayer thickness of 60 nmwas prepared. In each bilayer, the thickness ratio of Al to Ni was maintained at 1:2 to obtain an overall 1:3 atomic composition.The total thickness of Al/Ni multilayer films was around 1.2 μm.DSC curves show that the values of heat release in Al/Ni multilayer films with bilayer thicknesses of 60 (Al:Ni), 100 (Al:Ni), 150 (Al:Ni) and 60 (Al:3Ni) nm are 324.63 Jžg-1, 348.51 Jžg-1, 400.45 Jžg-1 and 69.85 Jžg-1, respectively. XRD measurements show that the final products of exothermic reactions with Al:Ni atomic ratio of 1:1 and 1:3 are the compound of AlNi and AlNi3, respectively.

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