Conjunction of Conducting Polymer Nanostructures with Macroporous Structured Graphene Thin Films for High-Performance Flexible Supercapacitors

2016 ◽  
Vol 8 (18) ◽  
pp. 11711-11719 ◽  
Author(s):  
Mushtaque A. Memon ◽  
Wei Bai ◽  
Jinhua Sun ◽  
Muhammad Imran ◽  
Shah Nawaz Phulpoto ◽  
...  
2018 ◽  
Vol 58 (12) ◽  
pp. 1299-1314 ◽  
Author(s):  
Meng Cheng ◽  
Yue‐Na Meng ◽  
Zhi‐Xiang Wei

2021 ◽  
Vol 9 (13) ◽  
pp. 4522-4531
Author(s):  
Chao Yun ◽  
Matthew Webb ◽  
Weiwei Li ◽  
Rui Wu ◽  
Ming Xiao ◽  
...  

Interfacial resistive switching and composition-tunable RLRS are realized in ionically conducting Na0.5Bi0.5TiO3 thin films, allowing optimised ON/OFF ratio (>104) to be achieved with low growth temperature (600 °C) and low thickness (<20 nm).


Author(s):  
Zhuang-Hao Zheng ◽  
Jun-Yun Niu ◽  
Dong-Wei Ao ◽  
Bushra Jabar ◽  
Xiao-Lei Shi ◽  
...  

Nanoscale ◽  
2021 ◽  
Vol 13 (5) ◽  
pp. 3079-3091
Author(s):  
Libo Chang ◽  
Zhiyuan Peng ◽  
Tong Zhang ◽  
Chuying Yu ◽  
Wenbin Zhong

Wood-inspired HCNF@Lig introduced into MXenes constructing a nacre-like material with high mechanical strength and excellent flexibility used as a flexible supercapacitor.


2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.


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