Centimeter-Scale, Large-Area, Few-Layer 1T′-WTe2 Films by Chemical Vapor Deposition and Its Long-Term Stability in Ambient Condition

2018 ◽  
Vol 122 (12) ◽  
pp. 7005-7012 ◽  
Author(s):  
Jie Li ◽  
Shuai Cheng ◽  
Zhixuan Liu ◽  
Wenfeng Zhang ◽  
Haixin Chang
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Ambient Condition ◽  
Large Area ◽  
Term Stability ◽  
Long Term Stability

Silicon Field Emission Arrays Coated with CoSi2 Layer Grown by Reactive Chemical Vapor Deposition

2000 ◽  
Vol 621 ◽  
Author(s):  
Byung Wook Han ◽  
Hwa Sung Rhee ◽  
Byung Tae Ahn ◽  
Nam Yang Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Field Emission ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Emission Current ◽  
Emission Properties ◽  
Long Term Stability ◽  
Field Emission Arrays

ABSTRACTWe prepared Si emitters coated with an MOCVD CoSi2 layer to improve the emission properties. The CoSi2 layer was grown in situ by reactive chemical vapor deposition of cyclopentadienyl dicarbonyl cobalt at 650 °C. The CoSi2 layer was conformally coated on the Si emitter tips and had a twinned structure at the epitaxial CoSi2/Si interface. The CoSi2-coated Si emitters showed an enhanced emission due to the increase of the number of emitting site from Fowler-Nordheim plot. The fluctuation of emission current was reduced by CoSi2 coating. But the long-term stability was not much improved.

scholarly journals Thermodynamics Controlled Sharp Transformation from InP to GaP Nanowires via Introducing Trace Amount of Gallium

2021 ◽  
Vol 16 (1) ◽  
Author(s):  
Zhenzhen Tian ◽  
Xiaoming Yuan ◽  
Ziran Zhang ◽  
Wuao Jia ◽  
Jian Zhou ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Driving Force ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Nanowire Growth ◽  
Calphad Approach ◽  
Deposition Method ◽  
Large Area ◽  
Growth Phenomenon

AbstractGrowth of high-quality III–V nanowires at a low cost for optoelectronic and electronic applications is a long-term pursuit of research. Still, controlled synthesis of III–V nanowires using chemical vapor deposition method is challenge and lack theory guidance. Here, we show the growth of InP and GaP nanowires in a large area with a high density using a vacuum chemical vapor deposition method. It is revealed that high growth temperature is required to avoid oxide formation and increase the crystal purity of InP nanowires. Introduction of a small amount of Ga into the reactor leads to the formation of GaP nanowires instead of ternary InGaP nanowires. Thermodynamic calculation within the calculation of phase diagrams (CALPHAD) approach is applied to explain this novel growth phenomenon. Composition and driving force calculations of the solidification process demonstrate that only 1 at.% of Ga in the catalyst is enough to tune the nanowire formation from InP to GaP, since GaP nucleation shows a much larger driving force. The combined thermodynamic studies together with III–V nanowire growth studies provide an excellent example to guide the nanowire growth.

scholarly journals Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition

ACS Omega ◽  
2021 ◽  
Author(s):  
Muhammad Aniq Shazni Mohammad Haniff ◽  
Nur Hamizah Zainal Ariffin ◽  
Poh Choon Ooi ◽  
Mohd Farhanulhakim Mohd Razip Wee ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Bilayer Graphene ◽  
Cold Wall ◽  
Polycrystalline Nickel ◽  
Large Area ◽  
Temperature Growth ◽  
Low Temperature Growth

CMOS-Compatible Synthesis of Large-Area, High-Mobility Graphene by Chemical Vapor Deposition of Acetylene on Cobalt Thin Films

ACS Nano ◽  
2011 ◽  
Vol 5 (9) ◽  
pp. 7198-7204 ◽  
Author(s):  
Michael E. Ramón ◽  
Aparna Gupta ◽  
Chris Corbet ◽  
Domingo A. Ferrer ◽  
Hema C. P. Movva ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Mobility ◽  
Chemical Vapor ◽  
Large Area ◽  
Cobalt Thin Films ◽  
Cmos Compatible

Fabrication of Boron Compensated Hydrogenated Amorphous Silicon Films with Significantly Improved Stability Using Plasma Enhanced Chemical Vapor Deposition Technique

1995 ◽  
Vol 377 ◽  
Author(s):  
Mohan K. Bhan
Keyword(s):  
Chemical Vapor ◽  
Short Term ◽  
Term Stability ◽  
Long Term Stability ◽  
Vapor Deposition Technique ◽  
Improved Stability ◽  
Donor Acceptor ◽  
B Doping ◽  
The Stability

ABSTRACTWe have systematically investigated the effects of addition of sub-ppm levels of boron on the stability of a-Si:H films and p-i-n devices, deposited by PE-CVD technique. The films thus produced with appropriate amounts of boron, show a significant improvement in stability, when soaked under both AM 1.5 (short-term) as well as 10×sun (long-term) illumination conditions. The opto-electronic properties of the films are quite respectable It is concluded that boron compensates the native impurities by forming donor-acceptor pairs, which reduces the “fast” defects and hence the initial degradation of the films. It is also speculated that boron may also be improving the short-term stability, by reducing the recombination of light generated electrons and holes, by converting D° into D+ states. The long-term stability appears to get affected by hydrogen dilution which seems to reduce the amount of “slow” defects. As a result of B doping of i-layer, the initial conversion efficiency of the devices decreases. It is presumed that our devices may contain an enhanced level of boron impurity, than expected, making them as worse material and to degrade less.

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