Theoretical and Experimental Investigations on Effects of Native Point Defects and Nitrogen Doping on the Optical Band Structure of Spinel ZnGa2O4

2018 ◽  
Vol 122 (10) ◽  
pp. 5509-5517 ◽  
Author(s):  
Yuguo Xia ◽  
Ting Wang ◽  
Xiaozhou Zhao ◽  
Xiuling Jiao ◽  
Dairong Chen
2014 ◽  
Vol 94 ◽  
pp. 35-43 ◽  
Author(s):  
Md. Sherajul Islam ◽  
Kenji Ushida ◽  
Satoru Tanaka ◽  
Takayuki Makino ◽  
Akihiro Hashimoto

1992 ◽  
Vol 279 ◽  
Author(s):  
L. Laanab ◽  
C. Bergaud ◽  
M. M. Faye ◽  
J. Faure ◽  
A. Martinez ◽  
...  

ABSTRACTComputer simulations in conjunction with TEM experiments have been used to test the different models usually adopted in the literature to explain the formation of “End Of Range”(EOR) defects which appear after annealing of preamorphized silicon layers. Only one survives careful experimental investigations involving Si+, Ge+, Sn+ amorphization at RT and LNT. The “excess-interstitial” model appears relevant at least for a semi-quantitative explanation of the source of point-defects which after recombination and agglomeration, lead to the formation of these defects. This model may be used for the numerical optimization of conditions for the production of high performances ullra-shallow junctions.


2011 ◽  
Vol 509 ◽  
pp. S658-S661 ◽  
Author(s):  
Lars Ismer ◽  
Anderson Janotti ◽  
Chris G. Van de Walle

1990 ◽  
Vol 216 ◽  
Author(s):  
M.A. Berding ◽  
A. Sher ◽  
A.-B. Chen

ABSTRACTNative point defects play an important role in HgCdTe. Here we discuss some of the relevant mass action equations, and use recently calculated defect formation energies to discuss relative defect concentrations. In agreement with experiment, the Hg vacancy is found to be the dominant native defect to accommodate excess tellurium. Preliminary estimates find the Hg antisite and the Hg interstitial to be of comparable densities. Our calculated defect formation energies are also consistent with measured diffusion activation energies, assuming the interstitial and vacancy migration energies are small.


2006 ◽  
Vol 527-529 ◽  
pp. 717-720 ◽  
Author(s):  
Sashi Kumar Chanda ◽  
Yaroslav Koshka ◽  
Murugesu Yoganathan

A room temperature PL mapping technique was applied to establish the origin of resistivity variation in PVT-grown 6H SiC substrates. A direct correlation between the native defect-related PL and resistivity was found in undoped (V-free) samples. In vanadium-doped samples with low vanadium content, the resistivity showed a good correlation with the total PL signal consisting of contributions from both vanadium and native point defects. Well-known UD1 and UD3 levels were revealed by low-temperature PL spectroscopy. Some correlation was observed between these low-temperature PL signatures and the resistivity distribution.


2017 ◽  
Vol 147 (2) ◽  
pp. 024707 ◽  
Author(s):  
Tingting Wang ◽  
Guiwu Liu ◽  
Yuanyuan Li ◽  
Haigang Hou ◽  
Ziwei Xu ◽  
...  

2015 ◽  
Vol 91 (4) ◽  
Author(s):  
V. Wang ◽  
Y. Kawazoe ◽  
W. T. Geng

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