Elucidating the Surface Reaction Mechanisms During Atomic Layer Deposition of LixAlySizO by in Situ Fourier Transform Infrared Spectroscopy

2016 ◽  
Vol 120 (22) ◽  
pp. 11837-11846 ◽  
Author(s):  
Jea Cho ◽  
Taeseung Kim ◽  
Trevor Seegmiller ◽  
Jane P. Chang
2018 ◽  
Vol 20 (39) ◽  
pp. 25343-25356 ◽  
Author(s):  
Michiel Van Daele ◽  
Christophe Detavernier ◽  
Jolien Dendooven

Thermal atomic layer deposition (ALD) and plasma-enhanced ALD (PE-ALD) of Pt, using MeCpPtMe3 as the precursor and O2 gas or O2 plasma as the reactant, are studied with in situ reflection Fourier transform infrared spectroscopy (FTIR) at different substrate temperatures.


2009 ◽  
Vol 1155 ◽  
Author(s):  
Min Dai ◽  
Jinhee Kwon ◽  
Yves J. Chabal ◽  
Mathew D. Halls ◽  
Roy G. Gordon

AbstractThe growth of of metallic copper by atomic layer deposition (ALD) using copper(I) di-sec-butylacetamidinate ([Cu(sBu-amd)]2) and molecular hydrogen (H2) on SiO2/Si surfaces has been studied. The mechanisms for the initial surface reaction and chemical bonding evolutions with each ALD cycle are inferred from in situ Fourier transform infrared spectroscopy (FTIR) data. Spectroscopic evidence for Cu agglomeration on SiO2 is presented involving the intensity variations of the SiO2 LO/TO phonon modes after chemical reaction with the Cu precursor and after the H2 precursor cycle. These intensity variations are observed over the first 20 ALD cycles at 185°C.


2021 ◽  
Vol 11 (6) ◽  
pp. 2021-2025
Author(s):  
Liujin Wei ◽  
Guan Huang ◽  
Yajun Zhang

The combination of time-resolved transient photoluminescence with in-situ Fourier transform infrared spectroscopy has been conducted to investigate the intrinsic phase structure-dependent activity of Bi2O3 catalyst for CO2 reduction.


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