Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations

2016 ◽  
Vol 120 (5) ◽  
pp. 2628-2641 ◽  
Author(s):  
R. C. Longo ◽  
J. H. G. Owen ◽  
S. McDonnell ◽  
D. Dick ◽  
J. B. Ballard ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition

Atomic‐scale designing of zeolite‐based catalysts by atomic layer deposition

ChemPhysChem ◽  
2021 ◽  
Author(s):  
Dan Xu ◽  
Junqing Yin ◽  
Ya Gao ◽  
Di Zhu ◽  
Shuyuan Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

scholarly journals Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition ◽  
Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

scholarly journals Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing

2010 ◽  
Vol 132 (3) ◽  
Author(s):  
Chris Y. Yuan ◽  
David A. Dornfeld
Keyword(s):  
Atomic Layer Deposition ◽  
Energy Flow ◽  
Scale Up ◽  
Atomic Layer ◽  
Development Stage ◽  
Layer Growth ◽  
Atomic Scale ◽  
Sustainability Analysis ◽  
Layer Deposition ◽  
Integrated Sustainability

Atomic layer deposition (ALD) is a promising nanotechnology for wide applications in microelectronics manufacturing due to its ability to control layer growth at atomic scale. Sustainability of ALD technology needs to be quantitatively investigated in this early development stage to improve its economic and environmental performance. In this paper, we present an integrated sustainability analysis of ALD technology through material and energy flow analyses. The study is performed on the ALD of Al2O3 high-κ dielectric film through trimethylaluminum and water binary reactions. The precursor utilizations, methane emissions, and nanowaste generations from the ALD process are all quantitatively studied. Energy flow analysis demonstrates that the ALD process energy consumption is mainly determined by the ALD cycle time rather than the process temperature. Scale-up performance of the ALD technology is also studied for both emission generations and energy consumptions. Strategies and methods for improving the sustainability performance of the ALD technology are suggested based on the analysis.

scholarly journals Atomic Layer Deposition of Titanium Oxide on Single-Layer Graphene: An Atomic-Scale Study toward Understanding Nucleation and Growth

2017 ◽  
Vol 29 (5) ◽  
pp. 2232-2238 ◽  
Author(s):  
Yucheng Zhang ◽  
Carlos Guerra-Nuñez ◽  
Ivo Utke ◽  
Johann Michler ◽  
Piyush Agrawal ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Single Layer ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Atomic Scale ◽  
Single Layer Graphene ◽  
Layer Graphene ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 806
Author(s):  
Guang-Jie Yuan ◽  
Jie-Fei Xie ◽  
Hao-Hao Li ◽  
Hong-Liang Lu ◽  
Ying-Zhong Tian
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Nanotube Arrays ◽  
Aspect Ratios ◽  
Carbon Nanotube Arrays ◽  
Layer Deposition ◽  
Vertically Aligned

Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed.

scholarly journals Atomic-Scale Structure and its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica

2021 ◽  
Author(s):  
Monu Kaushik ◽  
César Leroy ◽  
Zixuan Chen ◽  
David Gajan ◽  
Elena Willinger ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Acid Sites ◽  
Scale Structure ◽  
Atomic Scale ◽  
Oxide Layers ◽  
Al Content ◽  
Layer Deposition ◽  
Atomic Scale Structure

We report the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminium onto partially dehydroxylated silica. Such a detailed insight into the atomic structure of the species formed with increasing Al content was gained using a variety of one- and two-dimensional solid-state nuclear magnetic resonance (NMR) experiments involving <sup>27</sup>Al, <sup>1</sup>H and <sup>29</sup>Si nuclei. <sup>15</sup>N dynamic nuclear polarization surface-enhanced NMR spectroscopy (<sup>15</sup>N DNP SENS) and infrared spectroscopy using <sup>15</sup>N-labelled pyridine as a probe molecule reveal that aluminium oxide layers on amorphous silica contain both strong Bronsted and strong Lewis acid sites, whereby the relative abundance and nature of these sites, and therefore the acidity of the surface, evolve with increasing thickness of the alumina film. <br>

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