Temperature-Dependent Electric Field-Induced Optical Transitions of 2D Molybdenum Disulfide (MoS2) Thin Films: Temperature-Dependent Electroabsorption and Absorption

2021 ◽  
Author(s):  
Mohan Singh Mehata ◽  
Mrityunjay Kumar Singh ◽  
Kamlesh Awasthi ◽  
Prateek Sharma ◽  
Shailesh Rana ◽  
...  
Keyword(s):  
Thin Films ◽  
Electric Field ◽  
Molybdenum Disulfide ◽  
Optical Transitions ◽  
Temperature Dependent

Temperature Dependent Current-Voltage Characteristics in Thin SiO2 Films

1989 ◽  
Vol 159 ◽  
Author(s):  
Jin Zhao ◽  
N. M. Ravindra
Keyword(s):  
Thin Films ◽  
Electric Field ◽  
Temperature Dependent ◽  
Sio2 Films ◽  
Breakdown Electric Field ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Nordheim Tunneling

ABSTRACTAn analysis of the Fowler-Nordheim tunneling (FNT) theory and its application to temperature dependent current-voltage characteristics, of very thin films of SiO2 on silicon, is presented. The final results are believed to provide the most complete examination of FN emission theory and predict the breakdown electric field in thin SiO2 films. The role of the roughness, at the Si-SiO2 interface, in determining the FNT current in these structures is also discussed.

Dielectric Properties of Pb0.97La0.02Zr0.95Ti0.05O3 Antiferroelectric Thin Films Prepared at Different Annealing Temperatures

2011 ◽  
Vol 287-290 ◽  
pp. 2460-2463
Author(s):  
Wen Ping Geng ◽  
Xiu Jian Chou ◽  
Ya Ting Zhang ◽  
Mao Xiang Guo ◽  
Jun Liu
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Electric Field ◽  
Sol Gel ◽  
X Ray Diffraction ◽  
Temperature Dependent ◽  
Dielectric Constant And Loss ◽  
Sol Gel Process ◽  
Plzt Thin Films

Pb0.97La0.02Zr0.95Ti0.05O3(PLZT) antiferroelectric thin films were prepared on Pt (111)/ Ti/SiO2/Si (100) substrates by a sol-gel process. The influences of annealing temperature on the structures and dielectric properties of the PLZT antiferroelectric thin films were investigated. And the phase structure and crystal orientation were studied by X-ray diffraction analyses (XRD). The antiferroelectric characterization of the PLZT thin films annealed at different temperature was demonstrated by P(polarization)-E(electric field) and C(capactitance)-E(electric field) curves. The maximum polarizations for the films annealed at 650°C, 700°C and 750°C were 35μC/cm2, 42μC/cm2and 47μC/cm2, respectively. The temperature dependent of the dielectric constant and loss was measured under the frequency 1, 10, 100 and 1000 kHz. The films annealed at 700°C have high (100)-preferred orientation and excellent dielectric properties.

scholarly journals Direct measurement of the thermoelectric properties of electrochemically deposited Bi2Te3 thin films

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Jose Recatala-Gomez ◽  
Pawan Kumar ◽  
Ady Suwardi ◽  
Anas Abutaha ◽  
Iris Nandhakumar ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermoelectric Properties ◽  
Bismuth Telluride ◽  
Indium Tin Oxide ◽  
Seed Layer ◽  
Room Temperature ◽  
Low Cost ◽  
Temperature Dependent ◽  
Temperature Heat ◽  
Electrochemically Deposited

Abstract The best known thermoelectric material for near room temperature heat-to-electricity conversion is bismuth telluride. Amongst the possible fabrication techniques, electrodeposition has attracted attention due to its simplicity and low cost. However, the measurement of the thermoelectric properties of electrodeposited films is challenging because of the conducting seed layer underneath the film. Here, we develop a method to directly measure the thermoelectric properties of electrodeposited bismuth telluride thin films, grown on indium tin oxide. Using this technique, the temperature dependent thermoelectric properties (Seebeck coefficient and electrical conductivity) of electrodeposited thin films have been measured down to 100 K. A parallel resistor model is employed to discern the signal of the film from the signal of the seed layer and the data are carefully analysed and contextualized with literature. Our analysis demonstrates that the thermoelectric properties of electrodeposited films can be accurately evaluated without inflicting any damage to the films.

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