Epitaxial Electrodeposition of Cu(111) onto an l-Cysteine Self-Assembled Monolayer on Au(111) and Epitaxial Lift-Off of Single-Crystal-like Cu Foils for Flexible Electronics

2020 ◽  
Vol 124 (39) ◽  
pp. 21426-21434
Author(s):  
Bin Luo ◽  
Avishek Banik ◽  
Eric W. Bohannan ◽  
Jay A. Switzer
Langmuir ◽  
2007 ◽  
Vol 23 (22) ◽  
pp. 11027-11033 ◽  
Author(s):  
Rafael Madueño ◽  
Daniel García-Raya ◽  
Alfonso J. Viudez ◽  
José M. Sevilla ◽  
Teresa Pineda ◽  
...  

2009 ◽  
Vol 1202 ◽  
Author(s):  
Chi-Shun Chiu ◽  
Hong-Mao Lee ◽  
Shangjr Gwo

AbstractSurface biofunctionalization of group-III nitride semiconductors has recently attracted much interest due to their biocompatibility, nontoxicity, and long-term chemical stability under demanding physiochemical conditions for chemical and biological sensing. Among III-nitrides, aluminum nitride (AlN) and aluminum gallium nitride (AlGaN) are particularly important because they are often used as the sensing surfaces for sensors based on field-effect transistor or surface acoustic wave sensor structures. Patterned self-assembled monolayer (SAM) templates are composed of two types of organosilane molecules terminated with different functional groups (amino and methyl), which were fabricated on AlN/sapphire substrates by combining photolithography, lift-off process, and self-assembly technique. Clear imaging contrast of SAM micropatterns can be observed by field emission scanning electron microscopy (FE-SEM) operating at a low accelerating voltage in the range of 0.5–1.5 kV. In this work, the formation of green fluorescent protein (GFP) antibody microarrays was demonstrated by the specific protein binding of enhanced GFP (EGFP) labeling. The observed strong fluorescent signal from antibody functionalized regions on the SAM-patterned AlN surface indicates the retained biological activity of specific molecular recognition resulting from the antibody–EGFP interaction. The results reported here show that micropatterning of organosilane SAMs by the combination of photolithographic process and lift-off technique is a practical approach for the fabrication of reaction regions on AlN-based bioanalytical microdevices.


Science ◽  
2017 ◽  
Vol 355 (6330) ◽  
pp. 1203-1206 ◽  
Author(s):  
Naveen K. Mahenderkar ◽  
Qingzhi Chen ◽  
Ying-Chau Liu ◽  
Alexander R. Duchild ◽  
Seth Hofheins ◽  
...  

2018 ◽  
Vol 9 ◽  
pp. 311-320 ◽  
Author(s):  
Chong-You Chen ◽  
Chang-Ming Wang ◽  
Hsiang-Hua Li ◽  
Hong-Hseng Chan ◽  
Wei-Ssu Liao

The creation of bioactive substrates requires an appropriate interface molecular environment control and adequate biological species recognition with minimum nonspecific attachment. Herein, a straightforward approach utilizing chemical lift-off lithography to create a diluted self-assembled monolayer matrix for anchoring diverse biological probes is introduced. The strategy encompasses convenient operation, well-tunable pattern feature and size, large-area fabrication, high resolution and fidelity control, and the ability to functionalize versatile bioarrays. With the interface-contact-induced reaction, a preformed alkanethiol self-assembled monolayer on a Au surface is ruptured and a unique defect-rich diluted matrix is created. This post lift-off region is found to be suitable for insertion of a variety of biological probes, which allows for the creation of different types of bioactive substrates. Depending on the modifications to the experimental conditions, the processes of direct probe insertion, molecular structure change-required recognition, and bulky biological species binding are all accomplished with minimum nonspecific adhesion. Furthermore, multiplexed arrays via the integration of microfluidics are also achieved, which enables diverse applications of as-prepared substrates. By embracing the properties of well-tunable pattern feature dimension and geometry, great local molecular environment control, and wafer-scale fabrication characteristics, this chemical lift-off process has advanced conventional bioactive substrate fabrication into a more convenient route.


2008 ◽  
Vol 53 (27) ◽  
pp. 8026-8033 ◽  
Author(s):  
Daniel García-Raya ◽  
Rafael Madueño ◽  
José Manuel Sevilla ◽  
Manuel Blázquez ◽  
Teresa Pineda

2014 ◽  
Vol 5 ◽  
pp. 1918-1925 ◽  
Author(s):  
Jorge Trasobares ◽  
François Vaurette ◽  
Marc François ◽  
Hans Romijn ◽  
Jean-Louis Codron ◽  
...  

E-beam lithography has been used for reliable and versatile fabrication of sub-15 nm single-crystal gold nanoarrays and led to convincing applications in nanotechnology. However, so far this technique was either too slow for centimeter to wafer-scale writing or fast enough with the so-called dot on the fly (DOTF) technique but not optimized for sub-15 nm dots dimension. This prevents use of this technology for some applications and characterization techniques. Here, we show that the DOTF technique can be used without degradation in dots dimension. In addition, we propose two other techniques. The first one is an advanced conventional technique that goes five times faster than the conventional one. The second one relies on sequences defined before writing which enable versatility in e-beam patterns compared to the DOTF technique with same writing speed. By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray.


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