Ultrathin Molecular-Layer-by-Layer Polyamide Membranes: Insights from Atomistic Molecular Simulations

2016 ◽  
Vol 120 (35) ◽  
pp. 9484-9494 ◽  
Author(s):  
Thilanga P. Liyana-Arachchi ◽  
James F. Sturnfield ◽  
Coray M. Colina
2015 ◽  
Vol 356 ◽  
pp. 659-667 ◽  
Author(s):  
Joung-Eun Gu ◽  
Jong Suk Lee ◽  
Sang-Hee Park ◽  
Il Tae Kim ◽  
Edwin P. Chan ◽  
...  

2021 ◽  
Vol 618 ◽  
pp. 118637
Author(s):  
William D. Mulhearn ◽  
Vladimir P. Oleshko ◽  
Christopher M. Stafford

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.


2015 ◽  
Vol 488 ◽  
pp. 111-120 ◽  
Author(s):  
Soon-Bum Kwon ◽  
Jong Suk Lee ◽  
Soon Jin Kwon ◽  
Seong-Taek Yun ◽  
Seockheon Lee ◽  
...  

2018 ◽  
Vol 254 ◽  
pp. 916-925 ◽  
Author(s):  
Hyun Kim ◽  
Tae Sik Eom ◽  
Whirang Cho ◽  
Kyungbae Woo ◽  
Yuran Shon ◽  
...  

2013 ◽  
Vol 51 (22) ◽  
pp. 1647-1655 ◽  
Author(s):  
Edwin P. Chan ◽  
Allison P. Young ◽  
Jung-Hyun Lee ◽  
Christopher M. Stafford

MRS Advances ◽  
2016 ◽  
Vol 1 (35) ◽  
pp. 2421-2426
Author(s):  
Logan T. Kearney ◽  
John A. Howarter

ABSTRACTModel polyamide thin films were prepared through a controlled interfacial polymerization route known as molecular layer by layer (mLbL). Films were synthesized directly onto quartz crystals and subjected to halogenated aqueous environments that are known to cause degradation of the amide network. A quartz crystal microbalance (QCM) was used as the detection platform to ascertain mass loss due to degradation in real time. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) measurements were also performed at various stages of the degradation sequence to elucidate the chemical and morphological changes at the surfaces respectively. Appropriate strategies for accurately comparing material degradation resistance are proposed along with modifications to the crosslinked polyamide chemistry to produce more halogen tolerant polymeric surfaces.


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