The influence of electron correlation into the decomposition of core level binding energy shifts, measured by X-ray photoelectron spectroscopy (XPS), into initial and final effects is analysed for a series of molecules where these effects are noticeable.
The effects of ion bombardment and r.f. plasma oxidation of graphite surfaces on subsequent growth and electronic properties of vacuum deposited palladium clusters have been investigated by methods of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy with X-ray excitation (XAES). Due to the significantly increased density of surface defects on which the nucleation process occurs the bulk value of the Pd 3d core level binding energy is achieved at higher surface coverage by palladium on bombarded surfaces than on ordered graphite. Angle resolved photoelectron spectra of oxidized graphite surfaces reveal significant embedding of oxygen in graphite surface layers. The C 1s and O 1s photoelectron spectra are consistent with presence of two major oxygen species involving C-O and C=O type linkages which are not homogeneously distributed within the graphite surface layers. Two effects were observed on oxidized surfaces: an increase of palladium dispersion and interaction of the metal clusters with surface oxygen groups. Using the simple interpretation of the modified Auger parameter the relaxation and chemical shift contributions to the measured Pd core level shifts are estimated. In the region of low surface coverage by palladium the effect of palladium-oxygen interaction on Pd core level binding energy exceeds the effects of increased dispersity.
An X-ray photoelectron spectroscopy study has been performed on well characterized Bi 2 Sr 2 CaCu 2-x Co x O ~8 (x=0, 0.02 and 0.1) samples. There is a shift in the Sr binding energy with Co concentration, which is related to the change in T c . This relationship can be understood by the change of hole concentration in the CuO 2 planes as a result of Cobalt doping. The results of Bi 4f and Co 2p core level spectra are also discussed in detail.
ABSTRACTWe have studied the atomic states of arsenic (As) and phosphorus (P) in SiO2 using X-ray photoelectron spectroscopy (XPS). Silicon dioxide implanted with As or P shows multiple XPS core level peaks corresponding to the impurity atoms located in two distinct atomic sites. The binding energies of the two arsenic 3d core levels occur at 45.8 and 42.3 eV and the two phosphorus 2p core levels occur at 134.7 and 130.3 eV. When the implanted oxides are annealed in an oxygen ambient between 900°C and 950°C, only the highbinding- energy peaks of P and As are observed. This identifies the highbinding- energy core level peaks as being associated with the impurity (P or As) on silicon sites. Annealing in nitrogen at 950° C results in an increase in the low-binding-energy signal. The low-binding-energy peaks are associated with the impurity (P or As) bonded to silicon neighbors. The relative amounts of dopants in silicon and oxygen sites depend on ambient purity and processing details. Reference to previous work shows that the presence of As or P on silicon sites in SiO2 corresponds to a fast diffusing state whereas As or P on oxygen sites corresponds to a slow diffusing state [1].
The relationship between core level binding energy shifts (CLBEs), that can be experimentally determined by X-Ray Photoelectron Spectroscopy, and chemical bonding is analyzed for a series of MXenes, a new...
Effect of electron correlation in the decomposition of core level binding energy shifts into initial and final state contributions