Anisotropy in Time-Resolved Photoelectron Spectroscopy in the Gas Phase

2017 ◽  
Vol 121 (50) ◽  
pp. 9612-9618
Author(s):  
Oliver Schalk ◽  
Andrey E. Boguslavskiy
2020 ◽  
Vol 22 (27) ◽  
pp. 15608-15615
Author(s):  
Abed Mohamadzade ◽  
Susanne Ullrich

Gas-phase photophysics of 2,4-dithiouracil studied by time-resolved photoelectron spectroscopy.


2018 ◽  
Vol 47 (2) ◽  
pp. 309-321 ◽  
Author(s):  
Helen H. Fielding ◽  
Graham A. Worth

Time-resolved photoelectron spectroscopy measurements combined with quantum chemistry and dynamics calculations allow unprecedented insight into the electronic relaxation mechanisms of photoexcited molecules in the gas-phase.


2016 ◽  
Vol 18 (33) ◽  
pp. 22914-22920 ◽  
Author(s):  
Benoît Soep ◽  
Jean-Michel Mestdagh ◽  
Marc Briant ◽  
Marc-André Gaveau ◽  
Lionel Poisson

Direct measurements of Single vibronic Level InterSystem Crossing (SLISC) performed on the fluorenone molecule in the gas phase, by time resolved photoelectron spectroscopy, revealed the dramatic importance of its structure on intersystem crossing.


2021 ◽  
Vol 12 (1) ◽  
Author(s):  
S. Heinrich ◽  
T. Saule ◽  
M. Högner ◽  
Y. Cui ◽  
V. S. Yakovlev ◽  
...  

AbstractTime-resolved photoelectron spectroscopy with attosecond precision provides new insights into the photoelectric effect and gives information about the timing of photoemission from different electronic states within the electronic band structure of solids. Electron transport, scattering phenomena and electron-electron correlation effects can be observed on attosecond time scales by timing photoemission from valence band states against that from core states. However, accessing intraband effects was so far particularly challenging due to the simultaneous requirements on energy, momentum and time resolution. Here we report on an experiment utilizing intracavity generated attosecond pulse trains to meet these demands at high flux and high photon energies to measure intraband delays between sp- and d-band states in the valence band photoemission from tungsten and investigate final-state effects in resonant photoemission.


Author(s):  
Chao-Jiang Zhang ◽  
Peng Wang ◽  
Xi-Ling Xu ◽  
Hong-Guang Xu ◽  
Weijun Zheng

The AlnC5- (n = 1-5) clusters were detected in the gas-phase and were investigated by mass-selected anion photoelectron spectroscopy. The structures of AlnC5-/0 (n = 1-5) were explored by theoretical...


Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1595
Author(s):  
Nomin Lim ◽  
Yeon Sik Choi ◽  
Alexander Efremov ◽  
Kwang-Ho Kwon

This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etchant gas, it is interesting because of the liquid (at room temperature) nature and weaker environmental impact (lower global warming potential). The combination of several experimental techniques (double Langmuir probe, optical emission spectroscopy, X-ray photoelectron spectroscopy) allowed one (a) to compare performances of given gas systems in respect to the reactive-ion etching of Si and SiO2; and (b) to associate the features of corresponding etching kinetics with those for gas-phase plasma parameters. It was found that both gas systems exhibit (a) similar changes in ion energy flux and F atom flux with variations on input RF power and gas pressure; (b) quite close polymerization abilities; and (c) identical behaviors of Si and SiO2 etching rates, as determined by the neutral-flux-limited regime of ion-assisted chemical reaction. Principal features of C6F12O + Ar plasma are only lower absolute etching rates (mainly due to the lower density and flux of F atoms) as well as some limitations in SiO2/Si etching selectivity.


2021 ◽  
Vol 768 ◽  
pp. 138403
Author(s):  
Kendall D. Hughey ◽  
Russell G. Tonkyn ◽  
Warren W. Harper ◽  
Valerie L. Young ◽  
Tanya L. Myers ◽  
...  

2016 ◽  
Vol 7 (2) ◽  
pp. 1142-1150 ◽  
Author(s):  
David A. Hrovat ◽  
Gao-Lei Hou ◽  
Bo Chen ◽  
Xue-Bin Wang ◽  
Weston Thatcher Borden

The CO3 radical anion (CO3˙−) has been formed by electrospraying carbonate dianion (CO32−) into the gas phase.


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