scholarly journals Core and Valence Level Photoelectron Spectroscopy of Nanosolvated KCl

2021 ◽  
Author(s):  
Eetu Pelimanni ◽  
Lauri Hautala ◽  
Andreas Hans ◽  
Antti Kivimäki ◽  
Mati Kook ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Valence Level

Size-dependent study of Rb and K clusters using core and valence level photoelectron spectroscopy

2011 ◽  
Vol 64 (2-3) ◽  
pp. 347-352 ◽  
Author(s):  
M. -H. Mikkelä ◽  
M. Tchaplyguine ◽  
K. Jänkälä ◽  
T. Andersson ◽  
C. Zhang ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Size Dependent ◽  
Valence Level

scholarly journals Valence Level Character in a Mixed Perovskite Material and Determination of the Valence Band Maximum from Photoelectron Spectroscopy: Variation with Photon Energy

2017 ◽  
Vol 121 (48) ◽  
pp. 26655-26666 ◽  
Author(s):  
Bertrand Philippe ◽  
T. Jesper Jacobsson ◽  
Juan-Pablo Correa-Baena ◽  
Naresh K. Jena ◽  
Amitava Banerjee ◽  
...  
Keyword(s):  
Valence Band ◽  
Photon Energy ◽  
Photoelectron Spectroscopy ◽  
Valence Band Maximum ◽  
Band Maximum ◽  
Perovskite Material ◽  
Valence Level

Preferential Sputtering of Ni3Al Single Crystals Studied Using Atom-Probe Field-Ion Microscopy and XPS

1981 ◽  
Vol 39 ◽  
pp. 16-17
Author(s):  
M.P. Thomas ◽  
A.R. Waugh ◽  
M.J. Southon ◽  
Brian Ralph
Keyword(s):  
Single Crystals ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Depth Profiling ◽  
Analytical Techniques ◽  
Atom Probe ◽  
Probe Field ◽  
Preferential Sputtering ◽  
Argon Ion Bombardment ◽  
Argon Ion

It is well known that ion-induced sputtering from numerous multicomponent targets results in marked changes in surface composition (1). Preferential removal of one component results in surface enrichment in the less easily removed species. In this investigation, a time-of-flight atom-probe field-ion microscope A.P. together with X-ray photoelectron spectroscopy XPS have been used to monitor alterations in surface composition of Ni3Al single crystals under argon ion bombardment. The A.P. has been chosen for this investigation because of its ability using field evaporation to depth profile through a sputtered surface without the need for further ion sputtering. Incident ion energy and ion dose have been selected to reflect conditions widely used in surface analytical techniques for cleaning and depth-profiling of samples, typically 3keV and 1018 - 1020 ion m-2.

Spatially Resolved Photoelectron Spectroscopy: Recent Progress and Future Plans

1990 ◽  
Vol 48 (2) ◽  
pp. 388-389
Author(s):  
A. M. Bradshaw
Keyword(s):  
Photoelectron Spectroscopy ◽  
Chemical Reactivity ◽  
Target Material ◽  
Orbital Energy ◽  
Light Sources ◽  
Analytical Technique ◽  
Hartree Fock ◽  
Spatially Resolved ◽  
Koopmans Theorem ◽  
Surface Analytical Technique

X-ray photoelectron spectroscopy (XPS or ESCA) was not developed by Siegbahn and co-workers as a surface analytical technique, but rather as a general probe of electronic structure and chemical reactivity. The method is based on the phenomenon of photoionisation: The absorption of monochromatic radiation in the target material (free atoms, molecules, solids or liquids) causes electrons to be injected into the vacuum continuum. Pseudo-monochromatic laboratory light sources (e.g. AlKα) have mostly been used hitherto for this excitation; in recent years synchrotron radiation has become increasingly important. A kinetic energy analysis of the so-called photoelectrons gives rise to a spectrum which consists of a series of lines corresponding to each discrete core and valence level of the system. The measured binding energy, EB, given by EB = hv−EK, where EK is the kineticenergy relative to the vacuum level, may be equated with the orbital energy derived from a Hartree-Fock SCF calculation of the system under consideration (Koopmans theorem).

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