Prioritizing Direct Photolysis Products Predicted by the Chemical Transformation Simulator: Relative Reasoning and Absolute Ranking

2021 ◽  
Vol 55 (9) ◽  
pp. 5950-5958
Author(s):  
Chenyi Yuan ◽  
Caroline Tebes-Stevens ◽  
Eric J. Weber
Synthesis ◽  
2021 ◽  
Author(s):  
Michio Kurosu ◽  
Katsuhiko Mitachi ◽  
David Mingle

Abstract(4,4′-Bisfluorophenyl)methoxymethyl (BFPM) group of uridine ureido nitrogen shows good relative stability in a variety of chemical transformation reactions for uridine. The BFPM group can be cleaved by 2% of TFA in CH2Cl2 without affecting the Boc group.


Catalysts ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 480
Author(s):  
Valentin Dubois ◽  
Carmen S. D. Rodrigues ◽  
Ana S. P. Alves ◽  
Luis M. Madeira

In the present work, the degradation of p-nitrophenol (PNP) and its mineralization by a UV/Vis-based persulphate activation process was investigated. Firstly, a screening of processes as direct photolysis, persulphate alone and persulphate activated by radiation was performed. The incidence of radiation demonstrated to have an important role in the oxidant activation, allowing to achieve the highest PNP and total organic carbon (TOC) removals. The maximum PNP oxidation (100%) and mineralization (61.6%)—both after 2 h of reaction time—were reached when using T = 70 °C, (S2O82−) = 6.4 g/L and I = 500 W/m2. The influence of radiation type (ultraviolet/visible, visible or simulated solar light) was also evaluated, being found that the source with the highest emission of ultraviolet radiation (UV/visible) allowed to achieve the best oxidation efficiency; however, solar radiation also reached very-good performance. According to quenching experiments, the sulphate radical is key in the activated persulphate oxidation process, but the hydroxyl radical also plays an important role.


2016 ◽  
Vol 45 (43) ◽  
pp. 17312-17318 ◽  
Author(s):  
Eun-Kyung Kim ◽  
Dasom Park ◽  
Nabeen K. Shrestha ◽  
Jinho Chang ◽  
Cheol-Woo Yi ◽  
...  

An aqueous solution based synthetic method for binder-free Ag2Te thin films using ion exchange induced chemical transformation of Ag/AgxO thin films.


1970 ◽  
Vol 48 (8) ◽  
pp. 1333-1334 ◽  
Author(s):  
B. L. Kalra ◽  
A. R. Knight

The photodecomposition of acetone vapor at 255 °C sensitized by Cd 3P1 atoms has been investigated. On irradiation of the Cd–acetone system at 3261 Å, both direct and sensitized reaction occur. CO and CH4 are the only significant volatile products, and their yield is decreased by addition of SF6 as inert quenching gas. The required participation of triplet acetone molecules in the sensitized reaction and the virtual identity of the direct and sensitized decompositions provide additional evidence for the importance of this excited species in direct photolysis.


Author(s):  
Hella Boumaiza ◽  
Sébastien Naille ◽  
Aurélien Renard ◽  
Brian Grégoire ◽  
Martine Mallet ◽  
...  

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