Microcomputer assisted, single beam, photoacoustic spectrometer system for the study of solids

1978 ◽  
Vol 50 (4) ◽  
pp. 587-591 ◽  
Author(s):  
Harry E. Eaton ◽  
James D. Stuart
Keyword(s):  
Single Beam ◽  
Photoacoustic Spectrometer ◽  
Spectrometer System

A Single-Beam Approach to the Absorption Spectroscopy of Microcrystals

1993 ◽  
Vol 46 (7) ◽  
pp. 1041 ◽  
Author(s):  
E Krausz
Keyword(s):  
Inorganic Chemistry ◽  
Data Acquisition ◽  
Absorption Spectroscopy ◽  
Computer Control ◽  
Single Beam ◽  
Temperature Range ◽  
Optimal Sample ◽  
Spectrometer System ◽  
Absorption Spectrometer ◽  
Better Than

A single-beam microcrystal absorption spectrometer system is described that operates in the range 300-2600 nm, on crystals smaller than 50 μm , in the temperature range 5-300 K, with resolution better than 1 cm-1. The computer control of data acquisition and baseline storage with interpolation generates data of exceptional quality, and simplifies operation. The salient features of the apparatus are discussed, and the optimal sample absorption is calculated. Examples of optical spectra with relevance to some current interests in inorganic chemistry are provided.

Use of LaB6 for a High Quality, Small Energy Spread Beam in an Electron Velocity Spectrometer

1976 ◽  
Vol 34 ◽  
pp. 534-535 ◽  
Author(s):  
P. E. Batson ◽  
C. H. Chen ◽  
J. Silcox
Keyword(s):  
High Temperature ◽  
Energy Resolution ◽  
Electron Velocity ◽  
Electronic Excitations ◽  
Small Energy ◽  
Small Intensity ◽  
Good Energy ◽  
Spectrometer System ◽  
Electron Energy Loss ◽  
Very High

Electron energy loss experiments combined with microscopy have proven to be a valuable tool for the exploration of the structure of electronic excitations in materials. These types of excitations, however, are difficult to measure because of their small intensity. In a usual situation, the filament of the microscope is run at a very high temperature in order to present as much intensity as possible at the specimen. This results in a degradation of the ultimate energy resolution of the instrument due to thermal broadening of the electron beam.We report here observations and measurements on a new LaB filament in a microscope-velocity spectrometer system. We have found that, in general, we may retain a good energy resolution with intensities comparable to or greater than those available with the very high temperature tungsten filament. We have also explored the energy distribution of this filament.

INFRARED PHOTOACOUSTIC SPECTROMETER AND DATA ANALYSIS FOR HETEROGENEOUS OR LIQUID SAMPLES

1983 ◽  
Vol 44 (C6) ◽  
pp. C6-165-C6-170
Author(s):  
G. Rousset ◽  
J. P. Monchalin ◽  
L. Bertrand
Keyword(s):  
Data Analysis ◽  
Liquid Samples ◽  
Photoacoustic Spectrometer

Fabrication of two-layer integrated phase mask and single-beam, single exposure fabrication of 3D photonic crystal template using the mask

2008 ◽  
Author(s):  
Yuankun Lin ◽  
Ahmad Harb ◽  
Daniel Rodriguez ◽  
Karen Lozano ◽  
Di Xu ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Phase Mask ◽  
Single Exposure ◽  
Single Beam

Optimizing Gas-Assisted Processes for Ga and Xe FIB Circuit Edit Application

2016 ◽  
Author(s):  
Valery Ray ◽  
Josef V. Oboňa ◽  
Sharang Sharang ◽  
Lolita Rotkina ◽  
Eddie Chang ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Structural Damage ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Width ◽  
Ion Source ◽  
Reconstruction Technique ◽  
Beam Diameter ◽  
Current Profile ◽  
Single Beam

Abstract Despite commercial availability of a number of gas-enhanced chemical etches for faster removal of the material, there is still lack of understanding about how to take into account ion implantation and the structural damage by the primary ion beam during focused ion beam gas-assisted etching (FIB GAE). This paper describes the attempt to apply simplified beam reconstruction technique to characterize FIB GAE within single beam width and to evaluate the parameters critical for editing features with the dimensions close to the effective ion beam diameter. The approach is based on reverse-simulation methodology of ion beam current profile reconstruction. Enhancement of silicon dioxide etching with xenon difluoride precursor in xenon FIB with inductively coupled plasma ion source appears to be high and relatively uniform over the cross-section of the xenon beam, making xenon FIB potentially suitable platform for selective removal of materials in circuit edit application.

Sample Preparation and Preservation for TEM Analysis of Copper Interconnect Integrated Circuit

2004 ◽  
Author(s):  
Qiang Gao ◽  
Mark Zhang ◽  
Ming Li ◽  
Chorng Niou ◽  
W.T. Kary Chien
Keyword(s):  
Integrated Circuit ◽  
Thermal Exposure ◽  
Ambient Atmosphere ◽  
Ion Milling ◽  
Tem Analysis ◽  
Single Beam ◽  
Copper Interconnect ◽  
Beam Modulation ◽  
Area Of Interest ◽  
Transmission Electron

Abstract This paper examines copper-interconnect integrated circuit transmission electron microscope (TEM) sample contamination. It investigates the deterioration of the sample during ion milling and storage and introduces prevention techniques. The paper discusses copper grain agglomeration issues barrier/seed step coverage checking. The high temperature needed for epoxy solidifying was found to be harmful to sidewall coverage checking of seed. Single beam modulation using a glass dummy can efficiently prevent contamination of the area of interest in a TEM sample during ion milling. Adoption of special low-temperature cure epoxy resin can greatly reduce thermal exposure of the sample and prevent severe agglomeration of copper seed on via sidewall. TEM samples containing copper will deteriorate when stored in ordinary driers and sulphur contamination was found at the deteriorated point on the sample. Isolation of the sample from the ambient atmosphere has been verified to be very effective in protecting the TEM sample from deterioration.

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