Synthesis of nanostructured amorphous carbon-copper composite films by plasma-enhanced chemical vapour deposition

2016 ◽  
Vol 615 ◽  
pp. 195-201 ◽  
Author(s):  
Marius Černauskas ◽  
Liutauras Marcinauskas ◽  
Roberts Zabels
Keyword(s):  
Chemical Vapour Deposition ◽  
Amorphous Carbon ◽  
Vapour Deposition ◽  
Composite Films ◽  
Chemical Vapour ◽  
Copper Composite

A Comparison of the Surface Properties of DLC and Nanocrystalline Diamond

2007 ◽  
Vol 336-338 ◽  
pp. 1776-1779
Author(s):  
Chong Mu Lee ◽  
Kyung Ha Kim
Keyword(s):  
Chemical Vapour Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Scanning Force Microscopy ◽  
Nanocrystalline Diamond ◽  
Hard Coatings

Diamond-like carbon (DLC) films have been deposited by radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) with different Ar-CH4 mixtures. Nanocrystalline diamond films have been deposited by microwave plasma-enhanced chemical vapour deposition (MPCVD), using Ar-H2-CH4 mixtures. X-ray photoelectron spectroscopy (XPS) and nanotribological investigation (by scanning force microscopy) have been used to compare the mechanical properties and structures of these films. Highly orientated and non-orientated microcrystalline diamond films and MPCVD-produced amorphous carbon have also been studied by way of comparison. The diamond films exhibit a linear relationship between roughness and the coefficient of friction. The DLC and amorphous carbon have higher friction coefficients than the best performing diamond film, but may more easily be deposited as smooth coating. Possible applications for these various carbon-based films include microelectromechanical components, for which smooth, hard coatings are required.

scholarly journals Highly bioactive silver and silver/titania composite films grown by chemical vapour deposition

2007 ◽  
Vol 187 (1) ◽  
pp. 53-63 ◽  
Author(s):  
L.A. Brook ◽  
P. Evans ◽  
H.A. Foster ◽  
M.E. Pemble ◽  
A. Steele ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Composite Films ◽  
Chemical Vapour

Ultrananocrystalline Diamond / Amorphous Carbon Composite Films – Deposition, Characterization and Applications

2010 ◽  
Vol 159 ◽  
pp. 49-55
Author(s):  
Cyril Popov ◽  
Wilhelm Kulisch ◽  
Christo Petkov ◽  
Johann Peter Reithmaier
Keyword(s):  
Amorphous Carbon ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Composite Films ◽  
Chemical Vapour ◽  
Polycrystalline Diamond ◽  
Carbon Composite ◽  
Bonding Structure ◽  
Ultrananocrystalline Diamond ◽  
Plasma Chemical Vapour Deposition

UNCD/a-C composite films have been deposited by microwave plasma chemical vapour deposition from methane/nitrogen mixtures with 17% CH4 in the temperature range 500-770°C on various substrates such as monocrystalline silicon wafers, polycrystalline diamond, c-BN, TiN, GaAs, and other materials of technological interest. The resulting films have been thoroughly characterized with respect to their morphology, crystallinity, composition, and bonding structure. It was found that they are composed of diamond nanocrystallites (3-5 nm in diameter) surrounded by 1-1.5 nm amorphous carbon grain boundary material; the ratio of the volume fractions of crystalline and amorphous phase is close to unity. The investigations of the application-relevant properties of the UNCD/a-C films revealed that they are attractive for a number of mechanical, tribological, structural, and biomedical applications.

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