In-situ Fourier transform infrared spectroscopy gas phase studies of vanadium (IV) oxide coating by atmospheric pressure chemical vapour deposition using vanadyl (IV) acetylacetonate

2008 ◽  
Vol 516 (14) ◽  
pp. 4502-4507 ◽  
Author(s):  
D. Vernardou ◽  
M.E. Pemble ◽  
D.W. Sheel
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Gas Phase ◽  
Fourier Transform Infrared Spectroscopy ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Oxide Coating ◽  
Pressure Chemical

scholarly journals The role of gas-phase dynamics in interfacial phenomena during few-layer graphene growth through atmospheric pressure chemical vapour deposition

2020 ◽  
Vol 22 (6) ◽  
pp. 3481-3489 ◽  
Author(s):  
Fatin Bazilah Fauzi ◽  
Edhuan Ismail ◽  
Syed Noh Syed Abu Bakar ◽  
Ahmad Faris Ismail ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Gas Phase ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Interfacial Phenomena ◽  
Graphene Growth ◽  
Phase Dynamics ◽  
Pressure Chemical ◽  
Few Layer Graphene

An in-depth systematic study on the importance of fluid dynamics at the gas–solid interface to graphene growth in APCVD.

scholarly journals In-situ spatial and temporal electrical characterization of ZnO thin films deposited by atmospheric pressure chemical vapour deposition on flexible polymer substrates

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Alexander Jones ◽  
Kissan Mistry ◽  
Manfred Kao ◽  
Ahmed Shahin ◽  
Mustafa Yavuz ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Flexible Substrate ◽  
Chemical Vapour ◽  
Film Deposition ◽  
Zno Films ◽  
Flexible Polymer ◽  
Pressure Chemical

AbstractA technique is presented for collecting data on both the spatial and temporal variations in the electrical properties of a film as it is deposited on a flexible substrate. A flexible printed circuit board substrate with parallel electrodes distributed across its surface was designed. Zinc oxide films were then deposited on the flexible substrate at different temperatures via atmospheric pressure chemical vapour deposition (AP-CVD) using a spatial atomic layer deposition system. AP-CVD is a promising high-throughput thin film deposition technique with applications in flexible electronics. Collecting data on the film properties in-situ allows us to directly observe how deposition conditions affect the evolution of those properties in real-time. The spatial uniformity of the growing film was monitored, and the various stages of film nucleation and growth on the polymer substrate were observed. The measured resistance of the films was observed to be very high until a critical amount of material has been deposited, consistent with Volmer–Weber growth. Furthermore, monitoring the film resistance during post-deposition cooling enabled immediate identification of metallic or semiconducting behaviour within the conductive ZnO films. This technique allows for a more complete understanding of metal chalcogen film growth and properties, and the high volume of data generated will be useful for future implementations of machine-learning directed materials science.

Dependence of the intrinsic phase structure of Bi2O3 catalysts on photocatalytic CO2 reduction

2021 ◽  
Vol 11 (6) ◽  
pp. 2021-2025
Author(s):  
Liujin Wei ◽  
Guan Huang ◽  
Yajun Zhang
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Fourier Transform Infrared Spectroscopy ◽  
Phase Structure ◽  
Co2 Reduction ◽  
Fourier Transform Infrared ◽  
Time Resolved ◽  
Dependent Activity

The combination of time-resolved transient photoluminescence with in-situ Fourier transform infrared spectroscopy has been conducted to investigate the intrinsic phase structure-dependent activity of Bi2O3 catalyst for CO2 reduction.

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