Microcontact printing and selective surface dewetting for large area electronic applications

2007 ◽  
Vol 515 (19) ◽  
pp. 7679-7682 ◽  
Author(s):  
Amare Benor ◽  
Arne Hoppe ◽  
Veit Wagner ◽  
Dietmar Knipp
Keyword(s):  
Microcontact Printing ◽  
Large Area

Pneumatic Microcontact Printing for Large-area Patterning of Biomaterials

2017 ◽  
Vol 2017 (0) ◽  
pp. 1A1-M12
Author(s):  
Toshiki MINEMURA ◽  
Naoki IWASAKI ◽  
Moeto NAGAI ◽  
Takayuki SHIBATA
Keyword(s):  
Microcontact Printing ◽  
Large Area

Large Area, Rubber Stamped Plastic Circuits for Electronic Paper

2000 ◽  
Vol 660 ◽  
Author(s):  
John A. Rogers ◽  
Kirk Baldwin ◽  
Zhenan Bao ◽  
Ananth Dodabalapur ◽  
V.R. Raju ◽  
...  
Keyword(s):  
High Resolution ◽  
Microcontact Printing ◽  
Area Coverage ◽  
Electrical Performance ◽  
Large Area ◽  
Active Matrix ◽  
Plastic Electronics ◽  
Electronic Paper ◽  
Good Electrical Performance

ABSTRACTThis paper illustrates the use of a high resolution form of rubber stamping, known as microcontact printing (μCP), for patterning plastic active matrix drive circuitry designed for electronic paper. The high resolution (∼1 [.mu]m) of the printed elements, the large area coverage (∼1 sq. ft.) and the good electrical performance of these systems suggest that the methods, materials and processing sequences may be attractive for realistic applications of plastic electronics.

scholarly journals Flexure-based Roll-to-roll Platform: A Practical Solution for Realizing Large-area Microcontact Printing

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
Xi Zhou ◽  
Huihua Xu ◽  
Jiyi Cheng ◽  
Ni Zhao ◽  
Shih-Chi Chen
Keyword(s):  
Microcontact Printing ◽  
Large Area ◽  
Practical Solution ◽  
Roll To Roll

scholarly journals Large area μm and sub-μm structuring of gold layers with microcontact printing using 4″ and 1″ PDMS stamps

2008 ◽  
Vol 100 (5) ◽  
pp. 052024
Author(s):  
E Lausecker ◽  
W Schwinger ◽  
I Bergmair ◽  
M Mühlberger ◽  
R Schöftner
Keyword(s):  
Microcontact Printing ◽  
Large Area

Pneumatic Microcontact Printing for Large-Area Cell Patterning

2017 ◽  
Vol 2017.8 (0) ◽  
pp. PN-89
Author(s):  
Naoki Iwasaki ◽  
Toshiki Minemura ◽  
Moeto Nagai ◽  
Takayuki Shibata
Keyword(s):  
Microcontact Printing ◽  
Cell Patterning ◽  
Large Area

Large Area Microcontact Printing Presses for Plastic Electronics

2004 ◽  
Vol 846 ◽  
Author(s):  
Hee Hyun Lee ◽  
Etienne Menard ◽  
Nancy G. Tassi ◽  
John A. Rogers ◽  
Graciela B. Blanchet
Keyword(s):  
High Resolution ◽  
High Speed ◽  
Microcontact Printing ◽  
Low Cost ◽  
Manufacturing Processes ◽  
Flexible Substrates ◽  
Large Area ◽  
Plastic Electronics ◽  
Roll To Roll ◽  
Micron Size

ABSTRACTLow cost fabrication is key to the successful introduction of organic electronics and roll to roll manufacturing processes. We propose here that extending flexography into the micron size resolution regime may provide an economical commercialization path for plastic devices. Flexography is a high-speed technique commonly used for printing onto very large area flexible substrates.[1] Although low resolution and poor registration are characteristics of today's flexographic process, it has many similarities with soft lithographic techniques. This work shows that large, (12”×12”) high-resolution printing plates appropriate for use on small tag and label flexographic presses can be prepared using simple and inexpensive flexographic compatible processes. We illustrate the use of these plates for three representative soft lithographic processes: microcontact printing, replica molding, and phase shift lithography.

Fabrication of CdS Thin Film Pattern by CBD Method Using the Self-Assembled Monolayer

2004 ◽  
Vol 449-452 ◽  
pp. 449-452 ◽  
Author(s):  
S.-H. Jung ◽  
D.K. Jeong ◽  
J.Y. Kim ◽  
Woo Gwang Jung
Keyword(s):  
Thin Film ◽  
Deposition Time ◽  
Microcontact Printing ◽  
Stoichiometric Composition ◽  
Colloid Particle ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Cds Thin Film ◽  
Cbd Method ◽  
Cds Film

Microcontact printing of hydrophobic OTS (Octadecyl-Trichloro-Silane) material was made on various substrates, and finely patterned CdS thin film has been fabricated by CBD (Chemical Bath Deposition) method. In the preliminary experiment, it is confirmed that the size of colloid particle and roughness of surface of CdS thin film are increased with increase of pH, fabrication time and temperature. The optimum condition for the selective deposition of CdS film pattern using the SAM with microcontact printing was determined to be pH 10, temperature of 75°C, deposition time of 15 minute. Various patterns of different shape of CdS thin film were fabricated uniformly and satisfactorily in large area by the conditions determined in the present work. The stoichiometric composition of CdS was confirmed to be 1:1 by EDS and XPS.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

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