One step process for chemical vapour deposition of titanium dioxide thin films incorporating controlled structure nanoparticles

2006 ◽  
Vol 515 (4) ◽  
pp. 1956-1962 ◽  
Author(s):  
M.G. Nolan ◽  
M.E. Pemble ◽  
D.W. Sheel ◽  
H.M. Yates
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Step Process ◽  
One Step ◽  
Controlled Structure ◽  
Titanium Dioxide Thin Films

Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition

2006 ◽  
Vol 503 (1-2) ◽  
pp. 29-39 ◽  
Author(s):  
V.G. Bessergenev ◽  
R.J.F. Pereira ◽  
M.C. Mateus ◽  
I.V. Khmelinskii ◽  
D.A. Vasconcelos ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Photocatalytic Properties ◽  
Titanium Dioxide Thin Films

Chemical Vapour Deposition of Nitrogen-Doped Titanium Dioxide Thin Films

2011 ◽  
Vol 11 (9) ◽  
pp. 8274-8278 ◽  
Author(s):  
S. E. Alexandrov ◽  
M. V. Baryshnikova ◽  
L. A. Filatov ◽  
A. L. Shahmin ◽  
V. D. Andreeva
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Nitrogen Doped ◽  
Doped Titanium Dioxide ◽  
Titanium Dioxide Thin Films ◽  
Nitrogen Doped Titanium Dioxide

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

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