Lateral epitaxial overgrowth of GaN films on patterned sapphire substrates fabricated by wet chemical etching

2006 ◽  
Vol 515 (4) ◽  
pp. 1727-1730 ◽  
Author(s):  
Jing Wang ◽  
L.W. Guo ◽  
H.Q. Jia ◽  
Z.G. Xing ◽  
Y. Wang ◽  
...  
2013 ◽  
Vol 24 (33) ◽  
pp. 335301 ◽  
Author(s):  
Chong Geng ◽  
Lu Zheng ◽  
Huajing Fang ◽  
Qingfeng Yan ◽  
Tongbo Wei ◽  
...  

2015 ◽  
Vol 15 (7) ◽  
pp. 5250-5254 ◽  
Author(s):  
Jae-Kwan Kim ◽  
Sung Nam Lee ◽  
Keun-Man Song ◽  
Jae-Sik Yoon ◽  
Ji-Myon Lee

2006 ◽  
Vol 290 (2) ◽  
pp. 398-404 ◽  
Author(s):  
Jing Wang ◽  
L.W. Guo ◽  
H.Q. Jia ◽  
Z.G. Xing ◽  
Y. Wang ◽  
...  

2010 ◽  
Vol 4 (1) ◽  
pp. 012104 ◽  
Author(s):  
Chu-Young Cho ◽  
Sang-Jun Lee ◽  
Sang-Hyun Hong ◽  
Seung-Chul Park ◽  
Seong-Eun Park ◽  
...  

2006 ◽  
Author(s):  
H. S. Cheong ◽  
E. M. Park ◽  
H. Y. Kim ◽  
Y. S. Lee ◽  
C.-H. Hong ◽  
...  

2006 ◽  
Vol 23 (8) ◽  
pp. 2243-2246 ◽  
Author(s):  
Yu Nai-Sen ◽  
Guo Li-Wei ◽  
Chen Hong ◽  
Xing Zhi-Gang ◽  
Wang Jing ◽  
...  

2011 ◽  
Vol 335-336 ◽  
pp. 531-534
Author(s):  
Yuan Tian ◽  
Li Min Liang ◽  
Wen Cheng Wu ◽  
Qiu Yan Hao ◽  
Cai Chi Liu

The dislocations in electron-irradiated c-plane n-GaN epitaxial layers grown on c-plane sapphire substrates by MOCVD were revealed by several different wet chemical etching methods. And the defect-selective etching method combined with SEM was carried out to study the mechanism of dislocations generation of GaN. SEM images of GaN epilayers with several individual methods are in good agreement with each other. Among all the defects, threading dislocations (TDs) dominated in the GaN epilayers and these defects could be divided into three types. In addition, the EPDs after annealing at various temperatures were studied. The experimental results showed that suitable thermal annealing can eliminate some dislocations.


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