Electrochemical behavior of single layer CrN, TiN, TiAlN coatings and nanolayered TiAlN/CrN multilayer coatings prepared by reactive direct current magnetron sputtering

2006 ◽  
Vol 514 (1-2) ◽  
pp. 204-211 ◽  
Author(s):  
V.K. William Grips ◽  
Harish C. Barshilia ◽  
V. Ezhil Selvi ◽  
Kalavati ◽  
K.S. Rajam
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Electrochemical Behavior ◽  
Single Layer ◽  
Multilayer Coatings ◽  
Direct Current Magnetron Sputtering

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

2021 ◽  
pp. 127029
Author(s):  
Niklas Bönninghoff ◽  
Wahyu Diyatmika ◽  
Jinn P. Chu ◽  
Stanislav Mráz ◽  
Jochen M. Schneider ◽  
...  
Keyword(s):  
Thin Film ◽  
Metallic Glass ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Power ◽  
Direct Current Magnetron Sputtering

Synthesis and characterization of Cu3N–WC nanocomposite films prepared by direct current magnetron sputtering

2010 ◽  
Vol 518 (18) ◽  
pp. 5227-5232 ◽  
Author(s):  
Shihong Zhang ◽  
Yinsheng He ◽  
Mingxi Li ◽  
Yizhu He ◽  
Sikchol Kwon ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Nanocomposite Films ◽  
Synthesis And Characterization ◽  
Direct Current Magnetron Sputtering

Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

Vacuum ◽  
2010 ◽  
Vol 85 (2) ◽  
pp. 184-186 ◽  
Author(s):  
Huafu Zhang ◽  
Hanfa Liu ◽  
Chengxin Lei ◽  
Changkun Yuan ◽  
Aiping Zhou
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Transparent Conducting Films ◽  
Transparent Conducting ◽  
Direct Current Magnetron Sputtering ◽  
Doped Zno
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