Molecular level alignment and work function change of dimethyl–disulfide physisorbed thin films on Au(111)

2007 ◽  
Vol 601 (13) ◽  
pp. 2592-2596 ◽  
Author(s):  
Valentina De Renzi
Keyword(s):  
Thin Films ◽  
Work Function ◽  
Molecular Level ◽  
Dimethyl Disulfide ◽  
Function Change ◽  
Work Function Change

Work function studies of propylene, acetylene, hydrogen and nitrogen chemisorption on molybdenum

1982 ◽  
Vol 47 (11) ◽  
pp. 2996-3003
Author(s):  
Zdeněk Bastl
Keyword(s):  
Work Function ◽  
Surface Topography ◽  
Surface Coverage ◽  
Dissociative Chemisorption ◽  
Complete Coverage ◽  
Surface Sites ◽  
Function Change ◽  
Work Function Change

The work function changes of vacuum deposited molybdenum films caused by the chemisorption of propylene, acetylene, hydrogen and nitrogen were measured using the Kelvin vibrating capacitor method. During the hydrocarbon chemisorption, the work function increased in a low surface coverage region but decreased at the higher surface coverages. The saturation values of the work function changes corresponding to complete coverage of the surface by chemisorbed propylene and acetylene equal -0.08 eV and -0.42 eV, respectively. The observed dependences of the work function change on surface coverage are interpreted by the dissociative chemisorption of hydrocarbons on a limited number of surface sites which are simultaneously the sites of preferred adsorption. The extent of dissociation decreases in the adsorption with the increasing surface coverage. The results of the study of the work function changes induced by the hydrogen and nitrogen chemisorption enabled to draw several conclusions on the surface topography of the used films.

Fundamental studies on SnO2 by means of simultaneous work function change and conduction measurements

2005 ◽  
Vol 490 (1) ◽  
pp. 43-47 ◽  
Author(s):  
T. Sahm ◽  
A. Gurlo ◽  
N. Bârsan ◽  
U. Weimar ◽  
L. Mädler
Keyword(s):  
Work Function ◽  
Function Change ◽  
Work Function Change

scholarly journals THE WORK-FUNCTION CHANGE OF K/Cu(111)

1990 ◽  
Vol 39 (12) ◽  
pp. 1989
Author(s):  
WANG GENG ◽  
LI HAI-YANG ◽  
XU YA-BO
Keyword(s):  
Work Function ◽  
Function Change ◽  
Work Function Change

Characterization of Sc–O/W(100) Surface as Schottky Emitter: Work Function Change for Activation Processing

2000 ◽  
Vol 39 (Part 1, No. 2A) ◽  
pp. 577-580 ◽  
Author(s):  
Takashi Kawano ◽  
Yoshizo Takai ◽  
Ryuichi Shimizu
Keyword(s):  
Work Function ◽  
Function Change ◽  
Work Function Change
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