Erratum to: Quantization of electronic states in individual oxide-supported silver particles [Surface Science 572 (2004) 347]

2006 ◽  
Vol 600 (17) ◽  
pp. 3522-3523
Author(s):  
Niklas Nilius ◽  
Maria Kulawik ◽  
Hans-Peter Rust ◽  
Hans-Joachim Freund
Keyword(s):  
Surface Science ◽  
Electronic States ◽  
Silver Particles ◽  
Individual Oxide

Quantization of electronic states in individual oxide-supported silver particles

2004 ◽  
Vol 572 (2-3) ◽  
pp. 347-354 ◽  
Author(s):  
Niklas Nilius ◽  
Maria Kulawik ◽  
Hans-Peter Rust ◽  
Hans-Joachim Freund
Keyword(s):  
Electronic States ◽  
Silver Particles ◽  
Individual Oxide

UHV-TEM studies of laser-induced damage

1991 ◽  
Vol 49 ◽  
pp. 632-633
Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks
Keyword(s):  
Surface Science ◽  
Rapid Heating ◽  
Local Heating ◽  
Routine Practice ◽  
Transmission Electron ◽  
Northwestern University ◽  
Laser Induced Damage ◽  
Set Up ◽  
Focusing Lens ◽  
Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

The Application of Ultra-Thin Sectioning Techniques to Non-Biological Samples

1968 ◽  
Vol 26 ◽  
pp. 332-333
Author(s):  
C. F. Oster
Keyword(s):  
Biological Sciences ◽  
Epoxy Resin ◽  
Cross Sections ◽  
Biological Samples ◽  
Industrial Applications ◽  
Photographic Film ◽  
Silver Particles ◽  
Thin Sectioning ◽  
Embedding Medium

Although ultra-thin sectioning techniques are widely used in the biological sciences, their applications are somewhat less popular but very useful in industrial applications. This presentation will review several specific applications where ultra-thin sectioning techniques have proven invaluable.The preparation of samples for sectioning usually involves embedding in an epoxy resin. Araldite 6005 Resin and Hardener are mixed so that the hardness of the embedding medium matches that of the sample to reduce any distortion of the sample during the sectioning process. No dehydration series are needed to prepare our usual samples for embedding, but some types require hardening and staining steps. The embedded samples are sectioned with either a prototype of a Porter-Blum Microtome or an LKB Ultrotome III. Both instruments are equipped with diamond knives.In the study of photographic film, the distribution of the developed silver particles through the layer is important to the image tone and/or scattering power. Also, the morphology of the developed silver is an important factor, and cross sections will show this structure.

Investigation of cluster layers of small netal particles by TEM, SEM, EELS and by photoacoustic spectroscopy

1990 ◽  
Vol 48 (4) ◽  
pp. 250-251
Author(s):  
H. Seiler ◽  
U. Haas ◽  
K.H. Körtje
Keyword(s):  
Bulk Material ◽  
High Vacuum ◽  
Optical Methods ◽  
Metal Particles ◽  
Silver Particles ◽  
Low Loss ◽  
Plasmon Excitation ◽  
First Results ◽  
Diffraction Patterns ◽  
Small Metal Particles

The physical properties of small metal particles reveal an intermediate position between atomic and bulk material. Especially Ag has shown pronounced size effects. We compared silver layers evaporated in high vacuum with cluster layers of small silver particles, evaporated in N2 at a pressure of about 102 Pa. The investigations were performed by electron optical methods (TEM, SEM, EELS) and by Photoacoustic (PA) Spectroscopy (gas-microphone detection).The observation of cluster layers with TEM and high resolution SEM show small silver particles with diameters of about 50 nm (Fig. 1 and Figure 2, respectively). The electron diffraction patterns of homogeneous Ag layers and of cluster layers are similar, whereas the low loss EELS spectra due to plasmon excitation are quite different. Fig. 3 and Figure 4 show first results of EELS spectra of a cluster layer of small silver particles on carbon foil and of a homogeneous Ag layer, respectively.

Quantitative surface damage studies by H.R.E.M.

1989 ◽  
Vol 47 ◽  
pp. 632-633
Author(s):  
S. R. Singh ◽  
H. J. Fan ◽  
L. D. Marks
Keyword(s):  
Solar Wind ◽  
Quantitative Analysis ◽  
Surface Science ◽  
Surface Damage ◽  
Space Environment ◽  
Oxygen Desorption ◽  
The Past ◽  
Diffusion Controlled ◽  
Original Observation ◽  
Substantial Interest

Since the original observation that the surfaces of materials undergo radiation damage in the electron microscope similar to that observed by more conventional surface science techniques there has been substantial interest in understanding these phenomena in more detail; for a review see. For instance, surface damage in a microscope mimics damage in the space environment due to the solar wind and electron beam lithographic operations.However, purely qualitative experiments that have been done in the past are inadequate. In addition, many experiments performed in conventional microscopes may be inaccurate. What is needed is careful quantitative analysis including comparisons of the behavior in UHV versus that in a conventional microscope. In this paper we will present results of quantitative analysis which clearly demonstrate that the phenomena of importance are diffusion controlled; more detailed presentations of the data have been published elsewhere.As an illustration of the results, Figure 1 shows a plot of the shrinkage of a single, roughly spherical particle of WO3 versus time (dose) driven by oxygen desorption from the surface.

Integration of Core-Edge Spectroscopy Methods for the Study of Polymers

1996 ◽  
Vol 54 ◽  
pp. 154-155
Author(s):  
E. G. Rightor
Keyword(s):  
Excited State ◽  
Polymer Blends ◽  
Gas Phase ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Electronic States ◽  
Core Electron ◽  
Bulk Solids ◽  
Development Application

Core edge spectroscopy methods are versatile tools for investigating a wide variety of materials. They can be used to probe the electronic states of materials in bulk solids, on surfaces, or in the gas phase. This family of methods involves promoting an inner shell (core) electron to an excited state and recording either the primary excitation or secondary decay of the excited state. The techniques are complimentary and have different strengths and limitations for studying challenging aspects of materials. The need to identify components in polymers or polymer blends at high spatial resolution has driven development, application, and integration of results from several of these methods.

Modifications of a JEOL 2000EX TEM for insSitu surface studies

1993 ◽  
Vol 51 ◽  
pp. 640-641
Author(s):  
Michael T. Marshall ◽  
Xianghong Tong ◽  
J. Murray Gibson
Keyword(s):  
Electron Diffraction ◽  
Surface Science ◽  
Film Growth ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Transmission Electron ◽  
Fundamental Insight

We have modified a JEOL 2000EX Transmission Electron Microscope (TEM) to allow in-situ ultra-high vacuum (UHV) surface science experiments as well as transmission electron diffraction and imaging. Our goal is to support research in the areas of in-situ film growth, oxidation, and etching on semiconducter surfaces and, hence, gain fundamental insight of the structural components involved with these processes. The large volume chamber needed for such experiments limits the resolution to about 30 Å, primarily due to electron optics. Figure 1 shows the standard JEOL 2000EX TEM. The UHV chamber in figure 2 replaces the specimen area of the TEM, as shown in figure 3. The chamber is outfitted with Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), Residual Gas Analyzer (RGA), gas dosing, and evaporation sources. Reflection Electron Microscopy (REM) is also possible. This instrument is referred to as SHEBA (Surface High-energy Electron Beam Apparatus).The UHV chamber measures 800 mm in diameter and 400 mm in height. JEOL provided adapter flanges for the column.

Development of the UHV-STM

1990 ◽  
Vol 48 (1) ◽  
pp. 322-323
Author(s):  
M. Iwatsuki ◽  
S. Kitamura ◽  
A. Mogami
Keyword(s):  
Surface Science ◽  
Real Space ◽  
Atomic Scale ◽  
Scanning Tunneling ◽  
Great Promise ◽  
Force Microscopy ◽  
Atomic Force ◽  
Stm Image ◽  
Surface Construction ◽  
Very High

Since Binnig, Rohrer and associates observed real-space topographic images of Si(111)-7×7 and invented the scanning tunneling microscope (STM),1) the STM has been accepted as a powerful surface science instrument.Recently, many application areas for the STM have been opened up, such as atomic force microscopy (AFM), magnetic force microscopy (MFM) and others. So, the STM technology holds a great promise for the future.The great advantages of the STM are its high spatial resolution in the lateral and vertical directions on the atomic scale. However, the STM has difficulty in identifying atomic images in a desired area because it uses piezoelectric (PZT) elements as a scanner.On the other hand, the demand to observe specimens under UHV condition has grown, along with the advent of the STM technology. The requirment of UHV-STM is especially very high in to study of surface construction of semiconductors and superconducting materials on the atomic scale. In order to improve the STM image quality by keeping the specimen and tip surfaces clean, we have built a new UHV-STM (JSTM-4000XV) system which is provided with other surface analysis capability.

Sign in / Sign up

Export Citation Format

Share Document