Three-dimensional atom probe investigations of Ti–Al–N thin films

2009 ◽  
Vol 61 (7) ◽  
pp. 725-728 ◽  
Author(s):  
R. Rachbauer ◽  
E. Stergar ◽  
S. Massl ◽  
M. Moser ◽  
P.H. Mayrhofer
2015 ◽  
Vol 117 (17) ◽  
pp. 17B905 ◽  
Author(s):  
Naotaka Uchitomi ◽  
Hiroaki Inoue ◽  
Takahiro Kato ◽  
Hideyuki Toyota ◽  
Hiroshi Uchida

2021 ◽  
Author(s):  
Arindam Mondal ◽  
Akash Lata ◽  
Aarya Prabhakaran ◽  
Satyajit Gupta

Application of three-dimensional (3D)-halide perovskites (HaP) in photocatalysis encourages the new exercise with two-dimensional (2D) HaP based thin-films for photocatalytic degradation of dye. The reduced dimensionality to 2D-HaPs, with a...


1994 ◽  
Vol 361 ◽  
Author(s):  
V.A. Alyoshin ◽  
E.V. Sviridov ◽  
V.I.M. Hukhortov ◽  
I.H. Zakharchenko ◽  
V.P. Dudkevich

ABSTRACTSurface and cross-section relief evolution of ferroelectric epitaxial (Ba,Sr)TiO3 films rf-sputtered on (001) HgO crystal cle-avage surface versus the oxygen worKing gas pressure P and subst-rate temperature T were studied. Specific features of both three-dimensional and two-dimensional epitaxy mechanisms corresponding to various deposition conditions were revealed. Difference between low and high P-T-value 3D epitaxy was established. The deposition of films with mirror-smooth surfaces and perfect interfaces is shown to be possible.


2009 ◽  
Vol 57 (15) ◽  
pp. 4463-4472 ◽  
Author(s):  
Y.M. Chen ◽  
T. Ohkubo ◽  
M. Ohta ◽  
Y. Yoshizawa ◽  
K. Hono

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