Alarm clustering analysis and ACO based multi-variable alarms thresholds optimization in chemical processes

2018 ◽  
Vol 113 ◽  
pp. 132-140 ◽  
Author(s):  
Wende Tian ◽  
Guixin Zhang ◽  
Huiting Liang
Keyword(s):  
Clustering Analysis ◽  
Chemical Processes ◽  
Thresholds Optimization

Electrical Damage Due to Low Energy Plasma Processing of GaAs Structures

1991 ◽  
Vol 223 ◽  
Author(s):  
Hans P. Zappe ◽  
Gudrun Kaufel
Keyword(s):  
Chemical Processes ◽  
Low Energy ◽  
Electrical Behavior ◽  
Rapid Thermal Anneal ◽  
High Temperature Anneal ◽  
Significant Damage ◽  
Low Energies ◽  
Long Time ◽  
Physical Plasma

ABSTRACTThe effect of numerous plasma reative ion etch and physical milling processes on the electrical behavior of GaAs bulk substrates has been investigated by means of electric microwave absorption. It was seen that plasma treatments at quite low energies may significantly affect the electrical quality of the etched semiconductor. Predominantly physical plasma etchants (Ar) were seen to create significant damage at very low energies. Chemical processes (involving Cl or F), while somewhat less pernicious, also gave rise to electrical substrate damage, the effect greater for hydrogenic ambients. Whereas rapid thermal anneal treatments tend to worsen the electrical integrity, some substrates respond positively to long-time high temperature anneal steps.

2249-PUB: Clustering Analysis as a Tool to Define Endotypes in Type 1 Diabetes (T1D)

Diabetes ◽  
2020 ◽  
Vol 69 (Supplement 1) ◽  
pp. 2249-PUB
Author(s):  
ALEJANDRO F. SILLER ◽  
XIANGJUN GU ◽  
MUSTAFA TOSUR ◽  
MARCELA ASTUDILLO ◽  
ASHOK BALASUBRAMANYAM ◽  
...  
Keyword(s):  
Type 1 Diabetes ◽  
Clustering Analysis
Sign in / Sign up

Export Citation Format

Share Document