scholarly journals Monte Carlo Simulation of Energy Distribution of Radiation Field

2011 ◽  
Vol 15 ◽  
pp. 3299-3307
Author(s):  
Liu Yi ◽  
Chen Xiao-Bai ◽  
Wang Chun-Yan
2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.


2003 ◽  
Vol 85 (4) ◽  
pp. 433-437 ◽  
Author(s):  
Miguel L. Rodríguez ◽  
Lilian del Risco Reyna ◽  
Carlos E. de Almeida

1975 ◽  
Vol 8 (7) ◽  
pp. 820-828 ◽  
Author(s):  
R Shimizu ◽  
Y Kataoka ◽  
T Matsukawa ◽  
T Ikuta ◽  
K Murata ◽  
...  

2015 ◽  
Vol 42 (6Part21) ◽  
pp. 3464-3464
Author(s):  
F Horst ◽  
D Czarnecki ◽  
K Zink

2008 ◽  
Vol 5 (2) ◽  
pp. 124
Author(s):  
Seied Rabie Mahdavi ◽  
Alireza Shirazi ◽  
Ali Khodadadee ◽  
Mostafa Ghafoori ◽  
Asghar Mesbahi

2008 ◽  
Vol 13 (1) ◽  
pp. 23-28 ◽  
Author(s):  
Alireza Shirazi ◽  
Seied Rabie Mahdavi ◽  
Ali Khodadadee ◽  
Mostafa Ghaffory ◽  
Asghar Mesbahi

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