Synthesis and crystal structure of cobalt(II) Schiff base precursor for cobalt oxide thin film by thermal chemical vapor deposition

Polyhedron ◽  
2016 ◽  
Vol 110 ◽  
pp. 291-298 ◽  
Author(s):  
P. Sravanthi ◽  
C. Chandrakala ◽  
S. Raj Bharath ◽  
M.G. Johnson ◽  
S. Arokiasamy ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Schiff Base ◽  
Chemical Vapor Deposition ◽  
Cobalt Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Synthesis And Crystal Structure ◽  
Thermal Chemical Vapor Deposition

Preparation of Lithium Niobate Thin Film by Thermal Chemical Vapor Deposition

2003 ◽  
Vol 42 (Part 1, No. 8) ◽  
pp. 5227-5232 ◽  
Author(s):  
Y. S. Shin ◽  
M. Yoshida ◽  
Y. Akiyama ◽  
N. Imaishi ◽  
S. C. Jung
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Lithium Niobate ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thermal Chemical Vapor Deposition

Large field emission from carbon nanotubes grown on patterned catalyst thin film by thermal chemical vapor deposition

2002 ◽  
Vol 323 (1-4) ◽  
pp. 171-173 ◽  
Author(s):  
Takashi Ikuno ◽  
Tetsuro Yamamoto ◽  
Motoki Kamizono ◽  
Syunji Takahashi ◽  
Hiroshi Furuta ◽  
...  
Keyword(s):  
Thin Film ◽  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Field Emission ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Large Field ◽  
Thermal Chemical Vapor Deposition

Zinc oxide thin film synthesized by combustion chemical vapor deposition

2008 ◽  
Vol 255 (5) ◽  
pp. 2859-2863 ◽  
Author(s):  
Zhi-Yang Li ◽  
Fuchun Xu ◽  
Qi-Hui Wu ◽  
Jing Li
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Zinc Oxide Thin Film

Humidity Sensor Using CVD Deposited SnO2 Thin Film

2013 ◽  
Vol 667 ◽  
pp. 415-420
Author(s):  
A.K.S. Shafura ◽  
N.D. Md Sin ◽  
Mohamad Hafiz Mamat ◽  
S. Ahmad ◽  
Mohamad Rusop Mahmood
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Vapor Deposition ◽  
Humidity Sensor ◽  
Chemical Vapor ◽  
Sno2 Thin Film ◽  
Optical And Electrical Properties ◽  
Fesem Image ◽  
Thermal Chemical Vapor Deposition

In this paper we address sensitivity of SnO2 thin film deposited by thermal chemical vapor deposition in terms of its behavior towards humidity variations. The structural, optical and electrical properties of SnO2 thin film deposit at different substrate temperature grown by thermal chemical vapor deposition (CVD) are also reviewed. FESEM image reveal smallest particle size of SnO2 at substrate temperature 500°C. Pl measurement shows red shift of SnO2 at substrate temperature 500°C. All thin film performing slightly linear sensitivities towards relative humidity (RH%).

Effect of Thin Films on Radiative Transport in Chemical Vapor Deposition Systems

1999 ◽  
Author(s):  
Sandip Mazumder ◽  
Alfred Kersch
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Wave Theory ◽  
Radiative Properties ◽  
Wafer Surface ◽  
Contributing Factors ◽  
Thermal Chemical Vapor Deposition ◽  
Wafer Substrate

Abstract The thermal behavior of a wafer during a Rapid Thermal Chemical Vapor Deposition (RTCVD) process depends on its spectral radiative properties, along with other factors. One of the major contributing factors is the thin film that is deposited on the wafer substrate. The presence of a thin film (of thickness anywhere above 0.1 nm) can drastically alter the radiative properties of the wafer surface, thereby leading to significantly different wafer temperatures. This article presents a model to simulate thin film effects in RTCVD processes. Radiative transfer is modeled using a Monte-Carlo ray-tracing technique. Radiative properties are calculated using fundamental Electromagnetic Wave Theory. Simulation results match remarkably well with experimental data, demonstrating the importance of thin film effects.

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