Optical properties of plasma deposited amorphous carbon nitride films on polymer substrates

2010 ◽  
Vol 405 (1) ◽  
pp. 254-257 ◽  
Author(s):  
S.H. Mohamed ◽  
F.M. El-Hossary ◽  
G.A. Gamal ◽  
M.M. Kahlid
2001 ◽  
Vol 135 (2-3) ◽  
pp. 184-187 ◽  
Author(s):  
X.W Liu ◽  
C.H Tseng ◽  
J.H Lin ◽  
L.T Chao ◽  
H.C Shih

1999 ◽  
Vol 103 (1-3) ◽  
pp. 2570-2571 ◽  
Author(s):  
R.M. Valladares ◽  
Alipio G. Calles ◽  
Ariel A. Valladares

1999 ◽  
Vol 103 (1-3) ◽  
pp. 2572-2573 ◽  
Author(s):  
Ariel A. Valladares ◽  
R.M. Valladares ◽  
Alexander Valladares ◽  
M.A. Mc Nelis

2021 ◽  
pp. 2004001
Author(s):  
Youyu Duan ◽  
Yang Wang ◽  
Liyong Gan ◽  
Jiazhi Meng ◽  
Yajie Feng ◽  
...  

2005 ◽  
Vol 12 (02) ◽  
pp. 185-195
Author(s):  
M. RUSOP ◽  
T. SOGA ◽  
T. JIMBO

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.


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